Work

Nanoscale patterning of Ru. I. Effect of plasma nitridation and hydrogen reduction

Year: 2026

Type: article

Source: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

DOI: 10.1116/6.0005827

Authors: Owen Watkins, Harsono Simka, Jane P. Chang

Institutions: University of California, Los Angeles, Samsung Semiconductor (United States)

Language: English

Topic: Copper Interconnects and Reliability

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

Funder: Samsung

OpenAlex ID: W7225170814

FWCI:

Cites: 39

Cited by:

Related to: 10