Work

Balancing DOF margin and stochastic failure in high-NA EUV process

Year: 2026

Type: article

Source: Journal of Micro/Nanopatterning Materials and Metrology

DOI: 10.1117/1.jmm.26.1.011003

Authors: Kyuhwan Kim, Ju-Young Kim,, Song-Se Yi, Sam-Jong Choi

Institutions: Samsung (South Korea), Samsung Electronics (South Korea)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W7225312084

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