Work

Fluorination enhanced lithographic performance of sulfonium-based molecular nonchemically-amplified resist

Year: 2026

Type: article

Source: Journal of Micro/Nanopatterning Materials and Metrology

DOI: 10.1117/1.jmm.26.1.011203

Authors: Jundi Yuan, Peng Lian, Jinping Chen, Tianjun Yu, Yi Zeng, Xudong Guo, Shuangqing Wang, Rui Hu, Xiaolei Wen, Jun Zhao, Yanqing Wu, Guoqiang Yang, Yi Li

Institutions: Chinese Academy of Sciences, Technical Institute of Physics and Chemistry, University of Chinese Academy of Sciences, University of Science and Technology of China, National Synchrotron Radiation Laboratory, Shanghai Synchrotron Radiation Facility

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: National Natural Science Foundation of China

OpenAlex ID: W7225321686

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