Work

Effect of photoacid generator loading and quencher on development pathways in a model chemically amplified photoresist

Year: 2026

Type: article

Source: Journal of Micro/Nanopatterning Materials and Metrology

DOI: 10.1117/1.jmm.26.1.011204

Authors: Vishal V. Singh, Oleg Kostko, Dahyun Oh

Institutions: San Jose State University, Lawrence Berkeley National Laboratory

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W7225346423

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