Work

Atomic layer controlled electron beam induced etching of molybdenum using sequential O2 and HCl exposures with positive sample voltage

Year: 2026

Type: article

Source: Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

DOI: 10.1116/6.0005676

Authors: Michael A. Collings, Steven M. George

Institution: University of Colorado Boulder

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Semiconductor Research Corporation

OpenAlex ID: W7225387457

FWCI:

Cites: 68

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Related to: 10