Work

High landing energy SEM dimensional metrology for High NA EUVL

Year: 2026

Type: article

Source: Journal of Micro/Nanopatterning Materials and Metrology

DOI: 10.1117/1.jmm.26.1.011004

Authors: Gian Francesco Lorusso, Alain Moussa, Sahel Habashieh, Mihir Gupta

Institution: IMEC

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Digital Europe

OpenAlex ID: W7225414727

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