Work

Born–Mayer scattering model for KeV argon ions and fast neutrals in a charge-exchange atomic source for high-aspect-ratio etching

Year: 2026

Type: article

Source: Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena

DOI: 10.1116/6.0005714

Authors: Alexander V. Khrabrov, Igor. D. Kaganovich, Je-Hoi Mun, Sang Ki Nam

Institutions: Princeton Plasma Physics Laboratory, Samsung Electronics (South Korea)

Language: English

Topic: Low-Pressure Plasma Processing and Diagnostics

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W7225628006

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Cites: 63

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