Work

Enabling single-exposure metal logic with high-NA lithography

Year: 2026

Type: article

Source: Journal of Micro/Nanopatterning Materials and Metrology

DOI: 10.1117/1.jmm.26.1.011005

Authors: Shubhankar Das, Victor Blanco, Shruti Jambaldinni, Anuja De Silva, Joern-Holger Franke, Etienne de Poortere, Sandip Halder, Philippe Leray

Institution: IMEC

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W7225789759

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