Work

Enhancing the Néel Temperature of h -LuFeO3 Thin Films to 200 K by Substrate-Induced Strain

Year: 2026

Type: article

Source: Crystal Growth & Design

DOI: 10.1021/acs.cgd.6c01420

Authors: Zhen Qian, Ziyi Sun, Yixiao Jiang, Ang Tao, Xuexi Yan, Tingting Yao, Jingping Cui, Zhiqing Yang, Hengqiang Ye, Chunlin Chen

Institutions: University of Science and Technology of China, Chinese Academy of Sciences, Institute of Metal Research, Tohoku University, Ji Hua Laboratory

Language: English

Topic: Multiferroics and related materials

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W7225799044

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Cites: 41

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