Work

Inductively coupled Ar/CH4/H2 plasmas for low-temperature deposition of ordered carbon nanostructures

Year: 2004

Type: article

Abstract: The results of numerical simulations, optical emission spectroscopy (OES), and quadrupole mass spectrometry (QMS) of inductively coupled Ar/CH4/H2 plasmas in the plasma enhanced chemical vapor deposition (PECVD) of self-assembled vertically aligned carbon nanostructures (CNs) are presented. A spatially averaged (global) discharge model is developed to study the densities and fluxes of the radical neutrals and charged species, the effective electron temperature, methane conversion factor under various growth conditions. The numerical results show a remarkable agreement with the OES and QMS data. It is found that the deposited cation fluxes in the PECVD of CNs generally exceed those of the radical neutrals.

Source: Journal of Applied Physics

DOI: 10.1063/1.1642762

Authors: I. B. Denysenko, S. Xu, J. D. Long, P. P. Rutkevych, N. A. Azarenkov, K. Ostrikov

Institutions: Nanyang Technological University, V. N. Karazin Kharkiv National University, The University of Sydney

Language: English

Topic: Low-Pressure Plasma Processing and Diagnostics

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: green

Funders: Agency for Science, Technology and Research, Australian Research Council

OpenAlex ID: W98132313