Author

Kenneth E. Consalves

Institution: University of North Carolina at Chapel Hill

Observed institution: University of North Carolina at Chapel Hill

OpenAlex ID: A5000454572

Improved Lithographic Performance for EUV Resists Based on Polymers having a Photoacid Generator (PAG) in the Backbone

2005 · Muthiah Thiyagarajan, Kim Dean, et al. · Journal of Photopolymer Science and Technology · 60

Works count: 1

Citation count: 60

H-index: 1

I10-index: 1