Author

Benjamen M. Rathsack

Observed names: B. Rathsack, Benjamen Rathsack

Observed institutions: Tokyo Electron (Japan), IBM Research - Almaden, Texas Instruments (United States), The University of Texas at Austin

OpenAlex ID: A5002829962

Pattern scaling with directed self assembly through lithography and etch process integration

2012 · Benjamen Rathsack, Mark Somervell, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 56

Advances in directed self assembly integration and manufacturability at 300 mm

2013 · Benjamen Rathsack, Mark Somervell, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 26

Fabrication of 28nm pitch Si fins with DSA lithography

2013 · Gerard Schmid, Richard Farrell, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 25

High-volume manufacturing equipment and processing for directed self-assembly applications

2014 · Mark Somervell, Takashi Yamauchi, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 24

An enhanced 90nm high performance technology with strong performance improvements from stress and mobility increase through simple process changes

2004 · R. Khamankar, H. Bu, et al. · Symposium on VLSI Technology · 21

Resolution-linewidth roughness-sensitivity performance tradeoffs for an extreme ultraviolet polymer bound photo-acid generator resist

2011 · Roel Gronheid, Alessandro Vaglio Pret, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 20

Physical verification and manufacturing of contact/via layers using grapho-epitaxy DSA processes

2014 · J. Andres Torres, Kyohei Sakajiri, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 18

Synthesis and Properties of Diazopiperidiones for Use in Nonchemically Amplified Deep UV Photoresists

2004 · Peter I. Tattersall, David Breslin, et al. · Chemistry of Materials · 18

Driving DSA into volume manufacturing

2015 · Mark Somervell, Takashi Yamauchi, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 15

Bit Distribution and Reliability of High Density 1.5 V Ferroelectric Random Access Memory Embedded with 130 nm, 5 lm Copper Complementary Metal Oxide Semiconductor Logic

2006 · K. R. Udayakumar, K. Boku, et al. · Japanese Journal of Applied Physics · 15

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EUV RLS performance tradeoffs for a polymer bound PAG resist

2010 · Roel Gronheid, Alessandro Vaglio Pret, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 12

Modeling parameter extraction for DNQ-novolak thick film resists

1998 · Clifford L. Henderson, Steven A. Scheer, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 12

Characterization of an acetal-based chemically amplified resist for 257-nm laser mask fabrication

2001 · Benjamen M. Rathsack, Cyrus E. Tabery, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 6

A high performance 90 nm logic technology with a 37 nm gate length, dual plasma nitrided gate dielectric and differential offset spacer

2003 · B. Hornung, M. Bevan, et al. · Symposium on VLSI Technology · 5

Improved simulation of photoresists using new development models

1998 · Ralph R. Dammel, John P. Sagan, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5

Optical lithography simulation and photoresist optimization for photomask fabrication

1999 · Benjamen M. Rathsack, Cyrus E. Tabery, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4

DSA hole defectivity analysis using advanced optical inspection tool

2013 · Ryota Harukawa, Masami Aoki, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3

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Resists for Mask Making

2005 · Benjamen Rathsack, C Grant Willson, et al. · CRC Press eBooks · 3

Photoresist modeling for 365 nm and 257 nm laser photomask lithography and multi-analyte biosensors indexed through shape recognition

2001 · Benjamen M. Rathsack · Texas ScholarWorks (Texas Digital Library) · 3

Process development for 257-nm photomask fabrication using environmentally stable chemically amplified photoresists

2001 · Jeff A. Albelo, Benjamen M. Rathsack, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3

Simulation-based formulation of a nonchemically amplified resist for 257-nm laser mask fabrication

2000 · Benjamen M. Rathsack, Cyrus E. Tabery, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2

Lithography simulation of sub-0.30-μm resist features for photomask fabrication using i-line optical pattern generators

1999 · Benjamen M. Rathsack, Cyrus E. Tabery, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2

Simulation Based Formulation of a Non-Chemically Amplified Resist for 257 nm Laser Mask Fabrication

2008 · Benjamen M. Rathsack, Cyrus E. Tabery, et al. · 1

Rational design of bleachable nonchemically amplified DUV photoactive compounds

2001 · Benjamen M. Rathsack, Peter I. Tattersall, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Characterization of a non-chemically amplified resist for photomask fabrication using a 257-nm optical pattern generator

1999 · Benjamen M. Rathsack, Cyrus E. Tabery, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1

Works count: 31

Citation count: 301

H-index: 12

I10-index: 12