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Vinayak Rastogi
Observed name:
V Rastogi
Institution:
Applied Materials (United States)
Observed institutions:
Tokyo Electron (Japan),
National Institute of Standards and Technology,
North Carolina State University,
Applied Materials (United States),
Material Measurement Laboratory
ORCID:
0000-0002-1367-6099
Observed ORCID:
0000-0002-1367-6099
OpenAlex ID:
A5022005477
Synthesis of Light‐Diffracting Assemblies from Microspheres and Nanoparticles in Droplets on a Superhydrophobic Surface
2008
·
Vinayak Rastogi
, Sonia Melle
, et al.
·
Advanced Materials
·
175
Measuring Agglomerate Size Distribution and Dependence of Localized Surface Plasmon Resonance Absorbance on Gold Nanoparticle Agglomerate Size Using Analytical Ultracentrifugation
2011
·
Justin M. Zook
, Vinayak Rastogi
, et al.
·
ACS Nano
·
122
Analyzing Surfactant Structures on Length and Chirality Resolved (6,5) Single-Wall Carbon Nanotubes by Analytical Ultracentrifugation
2013
·
Jeffrey A. Fagan
, Ming Zheng
, et al.
·
ACS Nano
·
93
Anisotropic Particle Synthesis Inside Droplet Templates on Superhydrophobic Surfaces
2009
·
Vinayak Rastogi
, Antonio A. García
, et al.
·
Macromolecular Rapid Communications
·
84
Implementation of atomic layer etching of silicon: Scaling parameters, feasibility, and profile control
2016
·
Alok Ranjan
, Mingmei Wang
, et al.
·
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
·
43
Development and evaluation of realistic microbioassays in freely suspended droplets on a chip
2007
·
Vinayak Rastogi
, Orlin D. Velev
·
Biomicrofluidics
·
41
PDF
Size and density measurement of core–shell Si nanoparticles by analytical ultracentrifugation
2013
·
Kanokwan Nontapot
, Vinayak Rastogi
, et al.
·
Nanotechnology
·
33
PDF
Towards electrical testable SOI devices using Directed Self-Assembly for fin formation
2014
·
Chi-Chun Liu
, Cristina Estrada-Raygoza
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
23
Macromol. Rapid Commun. 2/2010
2010
·
Vinayak Rastogi
, Antonio A. García
, et al.
·
Macromolecular Rapid Communications
·
23
Driving DSA into volume manufacturing
2015
·
Mark Somervell
, Takashi Yamauchi
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
19
Microfluidic characterization of sustained solute release from porous supraparticles
2010
·
Vinayak Rastogi
, Krassimir P. Velikov
, et al.
·
Physical Chemistry Chemical Physics
·
18
Manufacturability considerations for DSA
2014
·
Richard A. Farrell
, Erik R. Hosler
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
14
Fin formation using graphoepitaxy DSA for FinFET device fabrication
2015
·
Chi-Chun Liu
, Fee Li Lie
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
11
Catalytic wet air oxidation of pulp and paper mill effluent
2003
·
Anurag Garg
, Somen Saha
, et al.
·
Indian Journal of Chemical Technology
·
8
Etch considerations for directed self-assembly patterning using capacitively coupled plasma
2018
·
Vinayak Rastogi
, Peter L. G. Ventzek
, et al.
·
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
·
7
Plasma etch patterning of EUV lithography: balancing roughness and selectivity trade off
2016
·
Vinayak Rastogi
, Genevieve Beique
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
7
Trench and hole patterning with EUV resists using dual frequency capacitively coupled plasma (CCP)
2015
·
Yannick Feurprier
, Katie Lutker-Lee
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
7
Dual frequency mid-gap capacitively coupled plasma (m-CCP) for conventional and DSA patterning at 10nm node and beyond
2014
·
Nihar Mohanty
, Akiteru Ko
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
6
Evaluation of novel processing approaches to improve extreme ultraviolet (EUV) photoresist pattern quality
2015
·
Cecilia Montgomery
, Jun Sung Chun
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
5
High speed EUV using post processing and self-aligned double patterning as a speed enhancement technique
2014
·
Jerome Wandell
, Anton deVilliers
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
5
(Invited) Control of Atomic Layer Reactions in Plasma Processing
2016
·
Peter Ventzek
, S D Sherpa
, et al.
·
ECS Transactions
·
4
PDF
Competitive adsorption–desorption of IgM monomers-dimers on silica and modified silica surfaces
2013
·
Suvajyoti Guha
, Joshua Wayment
, et al.
·
Journal of Colloid and Interface Science
·
2
Cover Picture: Synthesis of Light‐Diffracting Assemblies from Microspheres and Nanoparticles in Droplets on a Superhydrophobic Surface (Adv. Mater. 22/2008)
2008
·
Vinayak Rastogi
, Sonia Melle
, et al.
·
Advanced Materials
·
2
Plasma etch challenges for next-generation semiconductor manufacturing
2017
·
Vinayak Rastogi
, Peter L. G. Ventzek
, et al.
·
SPIE Newsroom
·
1
(Invited) Challenges for Etch Technology and the Integration of New Channel Materials Beyond 7 nm
2017
·
Alok Ranjan
, Vinayak Rastogi
, et al.
·
ECS Meeting Abstracts
·
1
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Works count:
33
Citation count:
754
H-index:
12
I10-index:
13
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