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Lorie-Mae Baclea-an

Observed names: Baclea-an, Lorie Mae, Baclea-an, Lorie-Mae, Lorie Mae Baclea-An, Lorie Mae Baclea-an
OpenAlex ID: A5035537503
Critical challenges for EUV resist materials
2011 · Patrick P. Naulleau, Christopher N. Anderson, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 65
The SEMATECH Berkeley MET: demonstration of 15-nm half-pitch in chemically amplified EUV resist and sensitivity of EUV resists at 6.x-nm
2012 · Chris Anderson, Dominic Ashworth, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 22
The SEMATECH Berkeley microfield exposure tool: learning at the 22-nm node and beyond
2009 · Patrick P. Naulleau, Christopher N. Anderson, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8
Pushing extreme ultraviolet lithography development beyond 22 nm half pitch
2009 · Patrick P. Naulleau, Christopher N. Anderson, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 7
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The SEMATECH Berkeley MET: extending EUV learning down to 16nm half pitch
2011 · Christopher N. Anderson, Lorie Mae Baclea-An, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Extreme ultraviolet mask surface cleaning effects on lithography process performance
2010 · Simi A. George, Lorie Mae Baclea-an, et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 4
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Using synchrotron light to accelerate EUV resist and mask materials learning
2011 · Patrick Naulleau, Christopher N. Anderson, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
50X, 75X mask cleaning effects on EUV lithography process and lifetime: lines and spaces, contacts, and LER
2012 · Brittany M. McClinton, Robert J. Chen, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
Effect of repetitive acid-based cleaning on EUV mask lifetime and lithographic performance
2011 · Robert J. Chen, Brittany M. McClinton, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
The SEMATECH Berkeley MET: extending EUV learning to 16-nm half pitch
2011 · Anderson, Christopher N., Baclea-an, Lorie Mae, et al. · University of North Texas Digital Library (University of North Texas)
22X mask cleaning effects on EUV lithography process and lifetime
2011 · Simi A. George, Robert J. Chen, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
22X mask cleaning effects on EUV lithography process and lifetime
2011 · George, Simi A., Chen, Robert J., et al. · OSTI OAI (U.S. Department of Energy Office of Scientific and Technical Information)
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Critical challenges for EUV resist materials
2011 · Naulleau, Patrick P., Anderson, Christopher N., et al. · OSTI OAI (U.S. Department of Energy Office of Scientific and Technical Information)
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Repetitive surface cleaning effects on process performance of an EUV mask
2011 · Simi George, Lorie Mae Baclea-an, et al. · eScholarship (California Digital Library)
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The SEMATECH Berkeley MET: Bridging the gap to 16-nm half pitch development
2010 · Patrick Naulleau, Christopher Anderson, et al. · eScholarship (California Digital Library)
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EUV mask surface cleaning effects on lithography process performance
2010 · Simi George, Lorie Mae Baclea-an, et al. · eScholarship (California Digital Library)
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The SEMATECH Berkeley microfield exposure tool: learning a the 22-nm node and beyond
2009 · Patrick Naulleau, Christopher N. Anderson, et al. · OSTI OAI (U.S. Department of Energy Office of Scientific and Technical Information)
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Works count: 17
Citation count: 114
H-index: 4
I10-index: 2
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