Author

Kristen Bevlin

OpenAlex ID: A5046566282

Annealing of dry etch damage in metallized and bare (-201) Ga2O3

2017 · Jiancheng Yang, Fan Ren, et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 75

Inductively coupled plasma etch damage in (-201) Ga2O3 Schottky diodes

2017 · Jiancheng Yang, Shihyun Ahn, et al. · Applied Physics Letters · 74

Inductively coupled plasma etching of bulk, single-crystal Ga2O3

2017 · Jiancheng Yang, Shihyun Ahn, et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 53

Dry etching of Ga2O3

2018 · Rohit Khanna, Kristen Bevlin, et al. · Elsevier eBooks · 12

Advanced photomask chrome etch: selectivity without sacrifice

2017 · Michael Morgan, Kristen Bevlin, et al. · SPIE Photomask Technology Conference · 1

List of contributors

2018 · Kwang Hyeon Baik, Kristen Bevlin, et al. · Elsevier eBooks

Inductively Coupled Plasma Etching and Electrically Active Damage of Bulk, Single-Crystal Ga2O3

2018 · Jiancheng Yang, Shihyun Ahn, et al. · ECS Meeting Abstracts

(Invited) Exploration of Process Techniques for Ga2O3 Based Electronics

2018 · Fan Ren, Stephen J. Pearton, et al. · ECS Meeting Abstracts

Works count: 8

Citation count: 215

H-index: 4

I10-index: 4