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Akihiro Usujima
Observed name:
A. Usujima
Institution:
Fujitsu Semiconductor (Japan)
Observed institutions:
Tokyo University of Science,
Fujitsu (Japan),
Fujitsu Semiconductor (Japan)
OpenAlex ID:
A5047985158
Optical and Electrical Properties of CuIn5S8 and AgIn5S8 Single Crystals
1981
·
Akihiro Usujima
, Satoshi Takeuchi
, et al.
·
Japanese Journal of Applied Physics
·
64
PDF
Effects of substrate treatment in positive chemically amplified resist
1995
·
Akihiro Usujima
, Kazuki Tago
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
7
Carrier profile designing to suppress systematic Vth variation related with device layout by controlling STI-enhanced dopant diffusions correlated with point defects
2009
·
H. Fukutome
, Y. Momiyama
, et al.
·
Technical digest - International Electron Devices Meeting/Technical digest
·
4
Generation Mechanism of Photoresist Residue after Ashing
1994
·
Akihiro Usujima
, Masaru Yasui
, et al.
·
Journal of The Electrochemical Society
·
2
PDF
Direct Measurement of Offset Spacer Effect on Carrier Profiles in Sub-50 nm p-Metal Oxide Semiconductor Field-Effect Transistors
2006
·
Hidenobu Fukutome
, Takashi Saiki
, et al.
·
Japanese Journal of Applied Physics
·
1
Pitch Dependence of Linewidth in the 0.25 µm Patterns Fabricated Using Positive Chemically Amplified Resist
1997
·
Akihiro Usujima
, Hajime Wada
, et al.
·
Japanese Journal of Applied Physics
·
1
PDF
Effect of Substrate Treatments on Resist Footing in Chemically Amplified System.
1997
·
Yuko Kaimoto
, Akihiko Otoguro
, et al.
·
Journal of Photopolymer Science and Technology
·
1
PDF
Direct measurement of the offset spacer effect on the carrier profiles in sub-50 nm p-MOSFETs
2007
·
Hidenobu Fukutome
, Takashi Saiki
, et al.
·
International Conference on Solid State Devices and Materials (SSDM)
Resist residue generated on TiN topographic substrates in positive chemically amplified resists
1998
·
Hajime Wada
, Akihiro Usujima
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Practical evaluation of 16M-DRAMs production with i-line phase-shift lithography
1992
·
Akihiro Usujima
, Ryuji Tazume
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
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Works count:
10
Citation count:
80
H-index:
3
I10-index:
1
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