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Sukjong Bae

Observed names: Seokjong Bae, Suk Jong Bae
ORCID: 0000-0002-3691-8425
Observed ORCID: 0000-0002-3691-8425
OpenAlex ID: A5048826708
Nano-oxidation of Si using ac modulation in atomic force microscope lithography
2005 · Cheol Hong Park, Sukjong Bae, et al. · Colloids and Surfaces A Physicochemical and Engineering Aspects · 13
Atomic force microscope anodization lithography using pulsed bias voltage synchronized with resonance frequency of cantilever
2005 · Sukjong Bae, Cheolsu Han, et al. · Nanotechnology · 12
Pattern placement error due to resist charging effect at 50kV e-beam writer: mechanism and its correction
2011 · Jin Choi, Suk Jong Bae, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7
Feasibility of multi-walled carbon nanotube probes in AFM anodization lithography
2007 · Ji Sun Choi, Sukjong Bae, et al. · Ultramicroscopy · 4
Deflector contamination in E-beam mask writer and its effect on pattern placement error of photomask for sub 20nm device node
2012 · Sukjong Bae, Jin Choi, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1
The Influence of the Resonant Frequency of a Tube-Type Piezo Actuator on Atomic Force Microscope Anodization Lithography
2007 · Sukjong Bae, Cheol Hong Park, et al. · Journal of the Korean Physical Society · 1
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Positive-tone photoresists based on tin-oxo nanoclusters for electron-beam and extreme UV lithography
2026 · Gayoung Kim, Yejin Ku, et al.
MBMW technical requirements for enabling high-NA era mask fabrication
2026 · Sungwoo Jang, Sungsil Choo, et al. · SPIE Novel Patterning Technologies
Actinic reflectometry for advanced metrology
2025 · Taewon Go, Seulki Roh, et al. · SPIE Photomask Technology Conference
Mass production adoption of EUV pellicle: methodology for evaluation and validation
2025 · Mun Ja Kim, Seongju Wi, et al.
Super-resolution fluorescence microscopy on E-beam resist film during electron beam exposure for mask patterning process
2023 · Sukjong Bae, Flip de Jong, et al. · Micro and Nano Engineering
Improvement of mask CD uniformity for below 45-nm node technology
2007 · Hojune Lee, Seokjong Bae, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Works count: 12
Citation count: 38
H-index: 4
I10-index: 2
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