Author

Thijs Hollink

Observed name: T. Hollink

Observed institution: ASML (Netherlands)

OpenAlex ID: A5058587409

Advanced wavefront engineering for improved imaging and overlay applications on a 1.35 NA immersion scanner

2011 · Frank Staals, Alena Andryzhyieuskaya, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 52

EUV source-mask optimization for 7nm node and beyond

2014 · Xiaofeng Liu, Rafael Howell, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 30

Mask 3D effects: impact on imaging and placement

2011 · Jo Finders, Thijs Hollink · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 26

Single exposure EUV patterning of BEOL metal layers on the IMEC iN7 platform

2017 · V. M. Blanco Carballo, J. Bekaert, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 25

Understanding of Out-of-Band DUV light in EUV lithography: controlling impact on imaging and mitigation strategies

2015 · N. Davydova, R. Kottumakulal, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8

NXE:3100 full wafer imaging performance and budget verification

2012 · Eelco van Setten, Koen van Ingen Schenau, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4

Works count: 6

Citation count: 145

H-index: 5

I10-index: 4