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Ralf Otto
Observed name:
R. Otto
OpenAlex ID:
A5078285820
Current state of 300-mm lithography in a pilot line environment
1999
·
Alain B. Charles
, John G. Maltabes
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
5
Lithography in a 300 mm pilot production line
2003
·
D. Ganz
, A. Charles
, et al.
·
IEEE International Symposium on Semiconductor Manufacturing conference proceedings
·
1
Effect of nonlinear errors on 300-mm wafer overlay performance
2000
·
Sebastian Schmidt
, Alain B. Charles
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Process performance comparisons on 300-mm i-line steppers, DUV stepper, and DUV scanners
2000
·
Thorsten Schedel
, Alain B. Charles
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
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Citation count:
6
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