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Brian Hoef

Observed names: B. Hoef, Brian H. Hoef, Hoef, Brian
OpenAlex ID: A5078747894
Status of EUV micro-exposure capabilities at the ALS using the 0.3-NA MET optic
2004 · Patrick Naulleau, Kenneth A. Goldberg, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 71
Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic
2002 · Patrick Naulleau, Kenneth A. Goldberg, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 38
EUV microexposures at the ALS using the 0.3-NA MET projection optics
2005 · Patrick Naulleau, Kenneth A. Goldberg, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 27
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22-nm Half-pitch extreme ultraviolet node development at the SEMATECH Berkeley microfield exposure tool
2009 · Patrick P. Naulleau, Christopher N. Anderson, et al. · Microelectronic Engineering · 26
Investigation of the current resolution limits of advanced extreme ultraviolet (EUV) resists
2006 · Patrick P. Naulleau, Clemens Rammeloo, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 19
A design study for synchrotron-based high-numerical-aperture scanning illuminators
2004 · Patrick P Naulleau, Paul E Denham, et al. · Optics Communications · 15
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Latest results from the SEMATECH Berkeley extreme ultraviolet microfield exposure tool
2009 · Patrick P. Naulleau, Christopher N. Anderson, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 14
Characterization of the synchrotron-based 0.3 numerical aperture extreme ultraviolet microexposure tool at the Advanced Light Source
2005 · Patrick Naulleau, Jason P. Cain, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 14
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Advanced extreme ultraviolet resist testing using the SEMATECH Berkeley 0.3-NA microfield exposure tool
2008 · Patrick P. Naulleau, Christopher N. Anderson, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 13
Extreme Ultraviolet Lithography Capabilities at the Advanced Light Source Using a 0.3-NA Optic
2005 · P. Naulleau, K.A. Goldberg, et al. · IEEE Journal of Quantum Electronics · 12
Demonstration of phase-shift masks for extreme-ultraviolet lithography
2006 · Bruno La Fontaine, Adam R. Pawloski, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 11
Static microfield printing at the Advanced Light Source with the ETS Set-2 optic
2002 · Patrick P. Naulleau, Kenneth A. Goldberg, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 11
Removal of surface contamination from EUV mirrors using low-power downstream plasma cleaning
2010 · Christopher G. Morgan, Patrick P. Naulleau, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 10
Recent results from the Berkeley 0.3-NA EUV microfield exposure tool
2007 · Patrick P. Naulleau, Chris N. Anderson, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 10
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The SEMATECH Berkeley microfield exposure tool: learning at the 22-nm node and beyond
2009 · Patrick P. Naulleau, Christopher N. Anderson, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8
Pushing extreme ultraviolet lithography development beyond 22 nm half pitch
2009 · Patrick P. Naulleau, Christopher N. Anderson, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 7
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Investigation of the current resolution limits of advanced EUVresists
2005 · Patrick Naulleau, Clemens Rammeloo, et al. · OSTI OAI (U.S. Department of Energy Office of Scientific and Technical Information) · 2
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Advanced resist testing using the SEMATECH Berkeley extreme ultraviolet microfield exposure tool
2007 · Patrick P. Naulleau, Christopher N. Anderson, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1
Contamination removal using the Evactron(R) De-contaminator
2010 · Christopher G. Morgan, Ronald Vane, et al. · eScholarship (California Digital Library)
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The SEMATECH Berkeley MET: Bridging the gap to 16-nm half pitch development
2010 · Patrick Naulleau, Christopher Anderson, et al. · eScholarship (California Digital Library)
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The SEMATECH Berkeley microfield exposure tool: learning a the 22-nm node and beyond
2009 · Patrick Naulleau, Christopher N. Anderson, et al. · OSTI OAI (U.S. Department of Energy Office of Scientific and Technical Information)
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Recent results from the Berkeley 0.3-NA microfield exposure tool
2007 · Patrick Naulleau, Christopher N. Anderson, et al. · eScholarship (California Digital Library)
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Advanced resist testing using the Berkeley extreme ultraviiolet microfiled exposure tool
2007 · Patrick Naulleau, Chris Anderson, et al. · eScholarship (California Digital Library)
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EUV microexposures at the ALS using the 0.3-NA MET projection optics - eScholarship
2005 · Patrick Naulleau, Kenneth A. Goldberg, et al.
Advanced 0.3-NA EUV lithography capabilities at the ALS
2005 · Patrick Naulleau, Erik Anderson, et al. · OSTI OAI (U.S. Department of Energy Office of Scientific and Technical Information)
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Works count: 28
Citation count: 309
H-index: 11
I10-index: 14
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