Author

Michael A. Fury

Observed names: M FURY, M. A. Fury, M. Fury, M.A. Fury

Observed institutions: DuPont (United States), IBM (United States), AlliedSignal (United States)

OpenAlex ID: A5079799338

The removal of deformed submicron particles from silicon wafers by spin rinse and megasonics

2000 · Fan Zhang, Ahmed A. Busnaina, et al. · Journal of Electronic Materials · 78

Chemical Vapor Deposition of Copper for Multilevel Metallization

1993 · Alain E. Kaloyeros, Michael A. Fury · MRS Bulletin · 58

Polishing Parameter Dependencies and Surface Oxidation of Chemical Mechanical Polishing of Al Thin Films

1999 · P. Wrschka, J. Hernandez, et al. · Journal of The Electrochemical Society · 43

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Chemical mechanical polishing of polymer films

1998 · Dan Towery, Michael A. Fury · Journal of Electronic Materials · 37

Chemical Mechanical Polishing of Al and SiO2 Thin Films: The Role of Consumables

1999 · J. Hernandez, P. Wrschka, et al. · Journal of The Electrochemical Society · 28

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A four-level VLSI bipolar metallization design with chemical-mechanical planarization

1992 · W. L. Guthrie, W. J. Patrick, et al. · IBM Journal of Research and Development · 28

Chemical-Mechanical Planarization of Aluminum-Based Alloys for Multilevel Metallization

1995 · M.A. Fury, D.L. Scherber, et al. · MRS Bulletin · 10

Milestones in a Quarter Century of CMP - Plenary

2009 · Michael A. Fury · ECS Transactions · 6

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Correlation of large particle count data in CMP slurry with production wafer defects

2014 · Jonathan Bennett, Michael A. Fury · International Conference on Planarization/CMP Technology (ICPT) · 4

Metallization for microelectronics program at the University at Albany: leveraging a long-term mentor relationship

2002 · M.A. Fury, A.E. Kaloyeros · Biennial University/Government/Industry Microelectronics Symposium · 3

Chemical Mechanical Polishing of Organic Polymeric Materials for IC Applications

1999 · D TOWERY, M FURY · Elsevier eBooks · 3

Fabrication of volcano emitters using chemical mechanical polishing (CMP)

2002 · H. Busta, G. Gammie, et al. · International Vacuum Nanoelectronics Conference · 2

Interconnection Challenges of the 1990'8

1992 · Michael A. Fury · MRS Proceedings · 2

The era of IoT advancing CMP consumables growth

2015 · Sue Davis, Karey Holland, et al. · 1

A Novel Light Scattering Analysis Method for Monitoring Undiluted CMP Slurry

2016 · Michael A. Fury, Michael F. Klein, et al. · ECS Meeting Abstracts

Light scattering analysis for undiluted slurry management

2015 · Michael A. Fury, Kelly A. Barry

Improving Yield with Real-time Monitoring of Large Particles in Undiluted CMP Slurry

2013 · Michael A. Fury

Milestones in a Quarter Century of CMP - Plenary

2009 · Michael A. Fury · ECS Meeting Abstracts

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Post-etch Cleaning Technology for Copper/low-k Applications

2004 · Michael A. Fury

Direct thin-film imaging, DTFI, based on PMOD (photochemical metal-organic deposition) methodology

2003 · Harold O. Madsen, Seigi Suh, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE

PMODTM-based Direct Thin Film Imaging, DTFITM, on Flexible Substrates

2003 · Paul J. Roman, Harold O. Madsen, et al. · MRS Proceedings

Interconnection Challenges of the 1990's

1992 · Michael A. Fury · MRS Proceedings

Works count: 22

Citation count: 303

H-index: 7

I10-index: 7