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Sho Kumakura

Observed name: S. Kumakura
OpenAlex ID: A5083005987
New tandem type ion source based on electron cyclotron resonance for universal source of synthesized ion beams
2014 · Yushi Kato, Yosuke Kurisu, et al. · Review of Scientific Instruments · 20
Novel technology of high-aspect-ratio etch utilizing coverage-controllable atomic layer deposition
2022 · Sho Kumakura, Hironari Sasagawa, et al. · Japanese Journal of Applied Physics · 19
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Electron energy distribution function by using probe method in electron cyclotron resonance multicharged ion source
2013 · Sho Kumakura, Yosuke Kurisu, et al. · Review of Scientific Instruments · 17
A method for high selective etch of Si 3 N 4 and SiC with ion modification and chemical removal
2019 · Sho Kumakura, Masahiro Tabata, et al. · Japanese Journal of Applied Physics · 15
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Controlling precise magnetic field configuration around electron cyclotron resonance zone for enhancing plasma parameters and beam current
2013 · Keisuke Yano, Yosuke Kurisu, et al. · Review of Scientific Instruments · 15
Accessibility condition of wave propagation and multicharged ion production in electron cyclotron resonance ion source plasma
2015 · Yushi Kato, Keisuke Yano, et al. · Review of Scientific Instruments · 9
Formation of multi-charged ion beams by focusing effect of mid-electrode on electron cyclotron resonance ion source
2014 · Youta Imai, Daiju Kimura, et al. · Review of Scientific Instruments · 8
Enhanced production of electron cyclotron resonance plasma by exciting selective microwave mode on a large-bore electron cyclotron resonance ion source with permanent magnet
2013 · Daiju Kimura, Yosuke Kurisu, et al. · Review of Scientific Instruments · 7
First operation and effect of a new tandem-type ion source based on electron cyclotron resonance
2015 · Yushi Kato, Daiju Kimura, et al. · Review of Scientific Instruments · 6
Effect of mid-electrode potential on multi-charged ion beam extracted from electron cyclotron resonance ion source
2014 · Y. Imai, D. Kimura, et al. · International Conference on Ion Implantation Technology · 5
Plasma potential measurement on ECRIS by using extracted ion beam
2014 · Sho Kumakura, Daiju Kimura, et al. · International Conference on Ion Implantation Technology · 4
Novel etch technologies utilizing atomic layer process for advanced patterning
2020 · Masanobu Honda, T. Katsunuma, et al. · Advanced Etch Technology and Process Integration for Nanopatterning · 3
Improved ion production and extraction on tandem type ECRIS with low magnetic mirror field
2014 · Yushi Kato, Keisuke Yano, et al. · International Conference on Ion Implantation Technology · 3
New innovative etch technologies utilizing state-of-the-art atomic-level process for advanced patterning
2022 · Sho Kumakura, Takayuki Katsunuma, et al. · IEEE Electron Devices Technology & Manufacturing Conference (EDTM) · 1
Development of state-of-the-art atomic-level process and future outlook
2021 · Masanobu Honda, Takayuki Katsunuma, et al. · The Japan Society of Applied Physics
Atomic layer controlled etching process using plasma
2020 · Sho Kumakura · IEICE Technical Report; IEICE Tech. Rep.
Atomic layer etching process utilizing plasma
2019 · Sho Kumakura, Yoshihide Kihara, et al. · IEICE Technical Report; IEICE Tech. Rep.
Spatial Distribution of Electron Energy Distribution Function along to Field Lines on ECRIS
2015 · Sho Kumakura · The Japan Society of Applied Physics
Plasma Potential Measurement on ECRIS by Using Extracted Ion Beam
2014 · Sho Kumakura · The Japan Society of Applied Physics
Selective microwave mode excitation and charge state distribution on the first stage of tandem type ECRIS
2014 · Yushi Kato, Daiju Kimura, et al. · International Conference on Ion Implantation Technology
Relation between electron energy distribution function in ECR plasma and charge state distribution of multi-charged ion beam extracted from ECRIS
2014 · Sho Kumakura · The Japan Society of Applied Physics
Electoron energy distribution in ECRIS plasma
2013 · Sho Kumakura · The Japan Society of Applied Physics
Works count: 22
Citation count: 132
H-index: 7
I10-index: 5
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