Get started
Author

Robert L. Bristol

Observed names: R L Bristol, R. Bristol, R. L. BRISTOL, R. L. Bristol, R.L. Bristol, Robert Bristol
ORCID: 0009-0007-2094-6548
Observed ORCID: 0009-0007-2094-6548
OpenAlex ID: A5083182129
Advancing 2D Monolayer CMOS Through Contact, Channel and Interface Engineering
2021 · K. P. O'Brien, C. J. Dorow, et al. · Technical digest - International Electron Devices Meeting/Technical digest · 128
Experimental study of the instability of unequal-strength counter-rotating vortex pairs
2003 · J. M. ORTEGA, R. L. BRISTOL, et al. · Journal of Fluid Mechanics · 119
3D heterogeneous integration of high performance high-K metal gate GaN NMOS and Si PMOS transistors on 300mm high-resistivity Si substrate for energy-efficient and compact power delivery, RF (5G and beyond) and SoC applications
2019 · Han Wui Then, C. Y. Huang, et al. · Technical digest - International Electron Devices Meeting/Technical digest · 115
On cooperative instabilities of parallel vortex pairs
2004 · R. L. BRISTOL, J. M. ORTEGA, et al. · Journal of Fluid Mechanics · 67
Advancing Monolayer 2-D nMOS and pMOS Transistor Integration From Growth to Van Der Waals Interface Engineering for Ultimate CMOS Scaling
2021 · Chelsey Dorow, Kevin O'Brien, et al. · IEEE Transactions on Electron Devices · 65
Gate length scaling beyond Si: Mono-layer 2D Channel FETs Robust to Short Channel Effects
2022 · C. J. Dorow, A. Penumatcha, et al. · Technical digest - International Electron Devices Meeting/Technical digest · 55
Wake Alleviation Properties of Triangular-Flapped Wings
2002 · J. M. Ortega, R. L. Bristol, et al. · AIAA Journal · 54
Far-Ultraviolet Performance of the Berkeley Spectrograph duringthe [ITAL]ORFEUS-SPAS II[/ITAL] Mission
1998 · Mark Hurwitz, Stuart Bowyer, et al. · The Astrophysical Journal · 50
PDF
Hafnia-Based FeRAM: A Path Toward Ultra-High Density for Next-Generation High-Speed Embedded Memory
2022 · Nazila Haratipour, Sou-Chi Chang, et al. · Technical digest - International Electron Devices Meeting/Technical digest · 38
Self‐consistent field theory investigation of directed self‐assembly in cylindrical confinement
2014 · Nabil Laachi, Kris T. Delaney, et al. · Journal of Polymer Science Part B Polymer Physics · 38
The tri-lateral challenge of resolution, photospeed, and LER: scaling below 50nm?
2007 · R. L. Bristol · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 38
300 mm MOCVD 2D CMOS Materials for More (Than) Moore Scaling
2022 · K. Maxey, C. H. Naylor, et al. · IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits) · 37
GaN and Si Transistors on 300mm Si(111) Enabled by 3D Monolithic Heterogeneous Integration
2020 · Han Wui Then, M. Radosavljevic, et al. · Symposium on VLSI Technology · 33
Lithographic stochastics: beyond 3σ
2017 · Robert L. Bristol, Marie E. Krysak · Journal of Micro/Nanopatterning Materials and Metrology · 29
Implementing flare compensation for EUV masks through localized mask CD resizing
2003 · Christof G. Krautschik, Manish Chandhok, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 26
The Hole Shrink Problem: Directed Self-Assembly Using Self-Consistent Field Theory
2013 · Tatsuhiro Iwama, Nabil Laachi, et al. · Journal of Photopolymer Science and Technology · 24
PDF
The hole shrink problem: Theoretical studies of directed self-assembly in cylindrical confinement
2013 · Nabil Laachi, Kris T. Delaney, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 21
One small step: world's first integrated EUVL process line
2005 · Jeanette M. Roberts, Terence Bacuita, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 18
Two-Photon Acid Generation in Thin Polymer Films. Photoinduced Electron Transfer As a Promising Tool for Subwavelength Lithography
2009 · Paul S. Billone, Julie M. Park, et al. · Chemistry of Materials · 17
Exposing extreme ultraviolet lithography at Intel
2006 · Jeanette Roberts, Terence Bacuita, et al. · Microelectronic Engineering · 16
Field-theoretic simulations of directed self-assembly in cylindrical confinement: placement and rectification aspects
2014 · Nabil Laachi, Tatsuhiro Iwama, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 15
Impact of trench width roughness on the graphoepitaxial assembly of block copolymers
2008 · Adam M. Welander, Paul F. Nealey, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 15
Sensitivity of EUV resists to out-of-band radiation
2009 · Jeanette M. Roberts, Robert L. Bristol, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 14
Comparison of techniques to measure the point spread function due to scatter and flare in EUV lithography systems
2004 · Manish Chandhok, Sang H. Lee, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 14
Erosion and degradation of EUV lithography collector mirrors under particle bombardment
2005 · Jean P. Allain, Ahmed Hassanein, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 13
Works count: 70
Citation count: 1,212
H-index: 18
I10-index: 27
Year
Topic
Type