Author

Martin Freitag

OpenAlex ID: A5088028362

Advanced cross-layer overlay simulation with exposure grid re-calculation

2024 · Yueh-Feng Lu, Chao Jen Tsou, et al. · 3

Advanced combined overlay and CD uniformity measurement mark for double patterning

2018 · Boris Habets, Hsiao Lin Hsu, et al. · 3

A comprehensive cross-layer overlay prediction method with reticle heating for enhanced process optimization

2025 · Qiqi Zhang, Yueh-Feng Lu, et al.

Innovative dual mark design for alignment verification and process monitoring in advanced lithography

2021 · Jia Hung Chang, En Chuan Lio, et al.

Intra-field alignment for overlay feed-forward simulation with sampling optimization

2019 · Cheng Hao Yang, Chun Chi Yu, et al.

Works count: 5

Citation count: 6

H-index: 2

I10-index: