Author

Tomoaki Kawasaki

Observed names: Kawasaki, Tomoaki, 川崎朋晃

Institution: Tokyo Institute of Technology

Observed institution: Tokyo Institute of Technology

OpenAlex ID: A5088511591

Laser-Assisted Counter-Facing Plasma Focus Device as a Light Source for EUV Lithography

2017 · Tatsuya Sodekoda, Shintaro Kurata, et al. · IEEE Transactions on Plasma Science · 2

Development of counter-facing discharge device for extreme ultraviolet source. Evaluation of electrode damages for stationary operation

2017 · Daisuke Nishii, Kouki Kanou, et al.

Development of counter-facing discharge device for extreme ultraviolet source. Control of current waveform and its effects on the plasma dynamics

2017 · Tomoaki Kawasaki, Kouki Kanou, et al.

対向プラズマフォーカス型euv光源装置の準定常動作

2014 · 狩野, 弘毅, Kanou, Kouki, et al. · Institutional Repositories DataBase (IRDB)

Quasi-steady Operation of Counter-facing Plasma Focus Device for High-Power Radiation Source in Extreme-ultraviolet Region

2014 · 堀岡一彦, Kazuhiko Horioka, et al. · Institutional Repositories DataBase (IRDB)

Works count: 6

Citation count: 2

H-index: 1

I10-index: