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Kentaro Matsunaga

Observed name: Kentaro MATSUNAGA
Institution: Kyoto University
OpenAlex ID: A5109986341
Hydrogen production by high temperature electrolysis with nuclear reactor
2008 · Seiji Fujiwara, Shigeo Kasai, et al. · Progress in Nuclear Energy · 141
Development of resist material and process for hp-2x-nm devices using EUV lithography
2010 · Kentaro Matsunaga, Hiroaki Oizumi, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 24
Resist edge roughness with reducing pattern size
1998 · Eishi Shiobara, Daisuke Kawamura, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 15
Progress of Resist Materials and Process for hp 2x-nm Devices using EUV Lithography
2010 · Kentaro Matsunaga, Hiroaki Oizumi, et al. · Journal of Photopolymer Science and Technology · 13
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Applicability of extreme ultraviolet lithography to fabrication of half pitch 35nm interconnects
2010 · Hajime Aoyama, Yuusuke Tanaka, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 12
Development status of EUV resist materials and processing at Selete
2011 · Kentaro Matsunaga, Gousuke Shiraishi, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 9
Performance of EUV molecular resists based on fullerene derivatives
2011 · Hiroaki Oizumi, Kentaro Matsunaga, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8
Nuclear Hydrogen Production by High-Temperature Electrolysis
2009 · Shigeo KASAI, Seiji FUJIWARA, et al. · Transactions of the Atomic Energy Society of Japan · 8
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Resolution capability of SFET with slit and dipole illumination
2011 · Yuusuke Tanaka, Kentaro Matsunaga, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7
Study on acid diffusion length effect with PAG-blended system and anion-bounded polymer system
2010 · Shinji Tarutani, Hideaki Tsubaki, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7
Hydrogen production system with high temperature electrolysis for nuclear power plant
2006 · Kentaro Matsunaga, Eiji Hoashi, et al. · 7
Electronic spectra of p-dicyanobenzene (p-DCNB), p-DCNB-H2O complex, and p-DCNB dimer in a supersonic jet
1992 · Keiko Fujita, Takashige Fujiwara, et al. · The Journal of Physical Chemistry · 7
EUVL Challenges towards 1x nm Generation
2011 · Suigen Kyoh, Yumi Nakajima, et al. · Journal of Photopolymer Science and Technology · 6
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Pattern Transfer Process Using Spun-on Carbon Film for KrF and ArF Lithography.
2001 · Yasuhiko Sato, Eishi Shiobara, et al. · Journal of Photopolymer Science and Technology · 6
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LWR reduction in low-k1 ArF-immersion lithography
2008 · Kentaro Matsunaga, Tomoya Oori, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
The resist-core spacer patterning process for fabrication of 2xnm node semiconductor devices
2011 · Koutarou Sho, Tomoya Oori, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Fabrication of 35nm via-hole patterns for interconnect test chips with EUV lithography
2010 · Yuusuke Tanaka, Hajime Aoyama, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Development of EUV resists based on various new materials
2010 · Hiroaki Oizumi, Kazuyuki Matsumaro, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Alternative resist processes for LWR reduction in EUVL
2010 · Koji Kaneyama, Kentaro Matsunaga, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Damage Judgement Method of Precast Beams Post-tensioned by Unbonded Tendons at Widened Beam End
2025 · Kentaro MATSUNAGA, Masanori TANI · Journal of Structural and Construction Engineering (Transactions of AIJ) · 3
Process liability evaluation for beyond 22nm node using EUVL
2010 · Kazuo Tawarayama, Hajime Aoyama, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Development Process for Chemically Amplified Resist by KrF Imaging
1998 · Kentaro Matsunaga, Daisuke Kawamura, et al. · Japanese Journal of Applied Physics · 3
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Defectivity reduction studies for ArF immersion lithography
2007 · Kentaro Matsunaga, Takehiro Kondoh, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
Dependence of resist profile on exposed area ratio
2001 · Eishi Shiobara, Daisuke Kawamura, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2
The Efficient Electricity Storage Device with Hydrogen using DC Link and its Design Method
2012 · Yasuo Takagi, Tsuneji Kameda, et al. · IEEJ Transactions on Power and Energy · 1
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Works count: 36
Citation count: 308
H-index: 8
I10-index: 5
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