Author

Anne Marie Goethals

Observed names: A. Goethals, A. M. Goethals, A.-M. Goethals, A.M. Goethals, Anne-Marie Goethals, Goethals, A.M.

Institution: IMEC

Observed institutions: IMEC, Lam Research (United States)

OpenAlex ID: A5110035731

Variable-threshold resist models for lithography simulation

1999 · John Randall, Kurt G. Ronse, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 34

EUV Resist Process Performance Investigations on the NXE3100 Full Field Scanner

2012 · Anne-Marie Goethals, Philippe Foubert, et al. · Journal of Photopolymer Science and Technology · 30

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Extreme ultraviolet lithography at IMEC: Shadowing compensation and flare mitigation strategy

2007 · G. F. Lorusso, A. M. Goethals, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 28

EUV lithography program at IMEC

2007 · Anne Marie Goethals, Rik Jonckheere, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 27

Lithography Options for the 32 nm Half Pitch Node and Beyond

2009 · K. Ronse, P. Jansen, et al. · IEEE Transactions on Circuits and Systems I Regular Papers · 26

Progress in EUV resist Performance

2006 · A. M. Goethals, R. Gronheid, et al. · Journal of Photopolymer Science and Technology · 24

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Progresses and Challenges of EUV Lithography Materials

2014 · Danilo De Simone, Anne Marie Goethals, et al. · Journal of Photopolymer Science and Technology · 22

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EUV pattern shift compensation strategies

2008 · T. Schmoeller, T. Klimpel, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 21

Characterization of EUV optics contamination due to photoresist related outgassing

2010 · I. Pollentier, A.-M. Goethals, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 20

Readiness of EUV Lithography for Insertion into Manufacturing: The IMEC EUV Program

2013 · Eric Hendrickx, Roel Gronheid, et al. · Journal of Photopolymer Science and Technology · 19

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Experimental validation of full-field extreme ultraviolet lithography flare and shadowing corrections

2008 · A. M. Myers, G. F. Lorusso, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 19

Investigation of EUV mask defectivity via full-field printing and inspection on wafer

2009 · Rik Jonckheere, Dieter Van Den Heuvel, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 18

Measurement and analysis of EUV photoresist related outgassing and contamination

2009 · I. Pollentier, G. Aksenov, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 17

Imaging performance of the EUV alpha semo tool at IMEC

2008 · G. F. Lorusso, J. Hermans, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 16

Demonstration of scaled 0.099µm2 FinFET 6T-SRAM cell using full-field EUV lithography for (Sub-)22nm node single-patterning technology

2009 · A. Veloso, S. Demuynck, et al. · Technical digest - International Electron Devices Meeting/Technical digest · 15

Gas phase silylation in the diffusion enhanced silylated resist process for application to sub-0.5 μm optical lithography

1990 · Ki-Ho Baik, L. Van den hove, et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 15

Dry development in an O2/SO2 plasma for sub-0.18 μm top layer imaging processes

1998 · A. M. Goethals, F. Van Roey, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 14

Recent Progress in ArF Lithography for the 100nm Node.

2001 · A.M. Goethals, G. Vandenberghe, et al. · Journal of Photopolymer Science and Technology · 13

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Stability and imaging of the ASML EUV alpha demo tool

2009 · Jan V. Hermans, Bart Baudemprez, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 12

Dependence of EUV mask printing performance on blank architecture

2008 · Rik Jonckheere, Yoonsuk Hyun, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 12

EUV Resist Screening: Current Performance and Issues

2005 · A. M. Goethals, R. Gronheld, et al. · Journal of Photopolymer Science and Technology · 11

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Performance of the ASML EUV Alpha Demo Tool

2010 · Jan V. Hermans, Eric Hendrickx, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 10

Investigation of mask defectivity in full field EUV lithography

2007 · Rik Jonckheere, Fumio Iwamoto, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 10

Full-field EUV and immersion lithography integration in 0.186μm2 FinFET 6T-SRAM cell

2008 · A. Veloso, S. Demuynck, et al. · Technical digest - International Electron Devices Meeting/Technical digest · 9

Introducing 157 nm Full Field Lithography

2003 · A.M. Goethals, P. De Bisschop, et al. · Journal of Photopolymer Science and Technology · 9

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Works count: 68

Citation count: 579

H-index: 15

I10-index: 23