Author

Alexander R. Giehl

Observed name: Alexander R Giehl

Institution: University of Kaiserslautern

Observed institution: University of Kaiserslautern

OpenAlex ID: A5110062241

Deep dry etching of GaAs and GaSb using Cl2/Ar plasma discharges

2003 · Alexander R. Giehl, Michael Gumbel, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 15

Deep reactive ion etching of GaSb in Cl2/Ar-plasma discharges using single-layer soft mask technologies

2003 · Alexander R Giehl, Matthias Kessler, et al. · Journal of Micromechanics and Microengineering · 14

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Works count: 2

Citation count: 29

H-index: 2

I10-index: 2