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Seung-Chan Moon

Observed names: Seung-chan Moon, Seungchan Moon
Institution: Hanyang University
OpenAlex ID: A5110129514
Positive and negative tone double patterning lithography for 50nm flash memory
2006 · Chang-Moon Lim, Seo-Min Kim, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 54
Highly Scalable Saddle-Fin (S-Fin) Transistor for Sub-50nm DRAM Technology
2006 · Sung-Wook Park, Sung-Joo Hong, et al. · Symposium on VLSI Technology · 48
Issues and challenges of double patterning lithography in DRAM
2007 · Seo-Min Kim, Sun-Young Koo, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 30
Dry etching of CoFe films using a CH4∕Ar inductively coupled plasma for magnetic random access memory application
2009 · Doo-Seung Um, Dong-Pyo Kim, et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 11
Comparative study of DRAM cell patterning between ArF immersion and EUV lithography
2009 · Tae-Seung Eom, Sarohan Park, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 9
Alignment system and process optimization for improvement of double patterning overlay
2008 · Won-kwang Ma, Jung-hyun Kang, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 9
Comparative study of binary intensity mask and attenuated phase shift mask using hyper-NA immersion lithography for sub-45nm era
2008 · Tae-Seung Eom, Jun-Taek Park, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 9
Actinic patterned mask imaging using extreme ultraviolet ptychography microscope with high harmonic generation source
2022 · Young Woong Kim, Dong Gi Lee, et al. · Applied Physics Express · 7
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Dry Etching of High-k Dielectric Thin Films in HBr/Ar Plasma
2009 · Dong-Pyo Kim, Gwan-Ha Kim, et al. · Journal of the Korean Physical Society · 6
Polymer structure modifications for immersion leaching and watermark control
2006 · Jae Woo Lee, Seung Keun Oh, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
Rinse liquid to improve pattern collapse behavior
2003 · Geunsu Lee, Sung-Koo Lee, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5
Molybdenum carbide pellicle for high-power EUV lithography
2023 · Yongkyung Kim, Kihun Seong, et al. · International Conference on Extreme Ultraviolet Lithography · 4
Optimization of BARC process for hyper-NA immersion lithography
2008 · Kilyoung Lee, Junghyung Lee, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Study on the reduction of defects in immersion lithography
2007 · Keundo Ban, Sarohan Park, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
Parameter investigation of PEB sensitivity
2006 · Seung Keun Oh, Eun Kyung Son, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4
EUV-patterning characterization using a 3D mask simulation and field EUV scanner
2009 · Jun-Taek Park, Yoon-Suk Hyun, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Hyper NA polarized imaging of 45nm DRAM
2007 · Chang-Moon Lim, Sarohan Park, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Improvement of alignment and overlay accuracy on amorphous carbon layers
2006 · Young-Sun Hwang, Eung-kil Kang, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Double exposure technology using silicon containing materials
2006 · Sungkoo Lee, Jaechang Jung, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Development of multi-function hard mask to simplify process step
2006 · Kilyoung Lee, Samyoung Kim, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Origin of LER and its solution
2005 · Geunsu Lee, Tae-Seung Eom, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Effective alignment techniques and their implementation to enhance total overlay accuracy on highly reflective films
1995 · Young-Hong Min, Seung-Chan Moon, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3
Feasibility of nanometer-thickness molybdenum carbide film for extreme ultraviolet lithography pellicle
2022 · Yongkyung Kim, Kihun Seong, et al. · International Conference on Extreme Ultraviolet Lithography · 2
Material Issues in Real Device Application of Multi-function Hard Mask Process
2006 · Kilyoung Lee, Gensu Lee, et al. · Journal of Photopolymer Science and Technology · 2
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Bulk effects of thermal flow resists
2005 · Sang-Kon Kim, Hye-Keun Oh, et al. · Journal of the Korean Physical Society · 2
Works count: 54
Citation count: 250
H-index: 7
I10-index: 4
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