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Chris Carney
OpenAlex ID:
A5110155513
100-nm node lithography with KrF?
2001
·
Michael Fritze
, Brian Tyrrell
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
11
Characterization of quartz-etched PSM masks for KrF lithography at the 100-nm node
2002
·
Peter D. Rhyins
, Michael Fritze
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
4
Minimization of image placement errors in chromeless phase-shift mask lithography
2002
·
Michael Fritze
, Brian Tyrrell
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
·
1
Investigation of full-field CD control of sub-100-nm gate features by phase-shift 248-nm lithography
2001
·
Michael Fritze
, Brian Tyrrell
, et al.
·
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
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Works count:
4
Citation count:
16
H-index:
2
I10-index:
1
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