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Dimitra Niakoula

Observed name: D. Niakoula
OpenAlex ID: A5110173533
Resolution, LER, and sensitivity limitations of photoresists
2008 · Gregg M. Gallatin, Patrick Naulleau, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 58
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System-level line-edge roughness limits in extreme ultraviolet lithography
2008 · Patrick P. Naulleau, Dimitra Niakoula, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 41
22-nm Half-pitch extreme ultraviolet node development at the SEMATECH Berkeley microfield exposure tool
2009 · Patrick P. Naulleau, Christopher N. Anderson, et al. · Microelectronic Engineering · 26
Partially Fluorinated, Polyhedral Oligomeric Silsesquioxane-Functionalized (Meth)Acrylate Resists for 193 nm Bilayer Lithography
2006 · Antonios M. Douvas, Frieda Van Roey, et al. · Chemistry of Materials · 26
Film quantum yields of EUV and ultra-high PAG photoresists
2008 · Elsayed Hassanein, Craig Higgins, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 22
Stochastic simulation studies of molecular resists
2007 · D. Drygiannakis, G.P. Patsis, et al. · Microelectronic Engineering · 21
Layer-by-layer UV micromachining methodology of epoxy resist embedded microchannels
2006 · M. Kitsara, M. Chatzichristidi, et al. · Microelectronic Engineering · 15
Latest results from the SEMATECH Berkeley extreme ultraviolet microfield exposure tool
2009 · Patrick P. Naulleau, Christopher N. Anderson, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 14
Advanced extreme ultraviolet resist testing using the SEMATECH Berkeley 0.3-NA microfield exposure tool
2008 · Patrick P. Naulleau, Christopher N. Anderson, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 13
Materials for lithography in the nanoscale
2008 · Panagiotis Argitis, Dimitra Niakoula, et al. · International Journal of Nanotechnology · 9
Absolute sensitivity calibration of extreme ultraviolet photoresists
2008 · Patrick P. Naulleau, Eric M. Gullikson, et al. · Optics Express · 8
Influence of base and photoacid generator on deprotection blur in extreme ultraviolet photoresists and some thoughts on shot noise
2008 · Christopher N. Anderson, Patrick P. Naulleau, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 7
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Exposure of molecular glass resist by e-beam and EUVIL
2007 · Cyril Vannuffel, Damien Djian, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7
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Resist process issues related to the glass transition changes in chemically amplified resist films
2003 · I. Raptis, D. Niakoula, et al. · Microelectronic Engineering · 6
Chemical binding of biomolecules to micropatterned epoxy modified surfaces for biosensing applications
2008 · P. Pavli, P.S. Petrou, et al. · Microelectronic Engineering · 4
Glass Transition Temperature Monitoring in Bilayer and Patterned Photoresist Films
2004 · Dimitra Niakoula, Ioannis Raptis, et al. · Japanese Journal of Applied Physics · 4
Application of a Novel Aqueous Base Developable Resist in Micromachining.
2001 · Ioannis Raptis, Margarita Chatzichristidi, et al. · Journal of Photopolymer Science and Technology · 4
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Positive molecular resists
2016 · Panagiotis Argitis, Veroniki P. Vidali, et al. · Frontiers of nanoscience · 3
Advanced resist testing using the SEMATECH Berkeley extreme ultraviolet microfield exposure tool
2007 · Patrick P. Naulleau, Christopher N. Anderson, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1
Solution-processable organic semiconductors based on anthracene as main components of active layers in OLEDs: Design, synthesis and application
2018 · Veroniki P. Vidali, Maria Vasilopoulou, et al. · Nano Research & Applications
Stochastic simulation studies of molecular resists
2015 · Δ. Δρυγιαννάκης, Γεώργιος Πάτσης, et al.
Glass transition temperature studies in thin photoresist films with an interferometric method
2003 · Dimitra Niakoula, Ioannis Raptis, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
Works count: 22
Citation count: 289
H-index: 9
I10-index: 9
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