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Kim Dean

Observed names: Dean, Kim, K.R. Dean, Kim R. Dean, Kim Renea Dean
OpenAlex ID: A5111741148
Improved Lithographic Performance for EUV Resists Based on Polymers having a Photoacid Generator (PAG) in the Backbone
2005 · Muthiah Thiyagarajan, Kim Dean, et al. · Journal of Photopolymer Science and Technology · 60
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Resolution, LER, and sensitivity limitations of photoresists
2008 · Gregg M. Gallatin, Patrick Naulleau, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 58
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Asphaltene adsorption on clay
1986 · Kim Renea Dean, James L. McAtee · Applied Clay Science · 43
Effects of material design on extreme ultraviolet (EUV) resist outgassing
2006 · Kim R. Dean, Kenneth E. Gonsalves, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 29
EUV microexposures at the ALS using the 0.3-NA MET projection optics
2005 · Patrick Naulleau, Kenneth A. Goldberg, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 27
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An analysis of EUV-resist outgassing measurements
2007 · Kim R. Dean, Iwao Nishiyama, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 26
Photons, electrons, and acid yields in EUV photoresists: a progress report
2008 · Robert Brainard, Elsayed Hassanein, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 24
Film quantum yields of EUV and ultra-high PAG photoresists
2008 · Elsayed Hassanein, Craig Higgins, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 22
Investigation of the current resolution limits of advanced extreme ultraviolet (EUV) resists
2006 · Patrick P. Naulleau, Clemens Rammeloo, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 19
EUV Resist Outgassing: How Much is Too Much?
2007 · Kim R. Dean, Gregory Debeaux, et al. · Journal of Photopolymer Science and Technology · 15
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Latest results from the SEMATECH Berkeley extreme ultraviolet microfield exposure tool
2009 · Patrick P. Naulleau, Christopher N. Anderson, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 14
Characterization of the synchrotron-based 0.3 numerical aperture extreme ultraviolet microexposure tool at the Advanced Light Source
2005 · Patrick Naulleau, Jason P. Cain, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 14
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Photoresist outgassing at 157 nm exposure
2001 · Stefan Hien, Steve Angood, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 14
Advanced extreme ultraviolet resist testing using the SEMATECH Berkeley 0.3-NA microfield exposure tool
2008 · Patrick P. Naulleau, Christopher N. Anderson, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 13
Benchmarking of commercial EUVL resists at SEMATECH
2008 · Andy Ma, Joo-on Park, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 12
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Quantitative measurement of EUV resist outgassing
2007 · Greg Denbeaux, Rashi Garg, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 12
Extreme Ultraviolet Lithography Capabilities at the Advanced Light Source Using a 0.3-NA Optic
2005 · P. Naulleau, K.A. Goldberg, et al. · IEEE Journal of Quantum Electronics · 12
Newly developed polymer bound photoacid generator resist for sub-100-nm pattern by EUV lithography
2005 · Kenneth E. Gonsalves, Muthiah Thiyagarajan, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 12
Effects of Airborne Molecular Contamination on DUV Photoresists.
1997 · Kim R. Dean, Daniel A. Miller, et al. · Journal of Photopolymer Science and Technology · 12
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Recent results from the Berkeley 0.3-NA EUV microfield exposure tool
2007 · Patrick P. Naulleau, Chris N. Anderson, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 10
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Influence of base and photoacid generator on deprotection blur in extreme ultraviolet photoresists and some thoughts on shot noise
2008 · Christopher N. Anderson, Patrick P. Naulleau, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 7
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Investigation of sensitivity of extreme ultraviolet resists to out-of-band radiation
2008 · Chimaobi Mbanaso, Gregory Denbeaux, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7
Molecular Challenges of Immersion and Extreme Ultraviolet (EUV) Resists
2006 · Kim R. Dean, David Stark · Journal of Photopolymer Science and Technology · 7
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Material design and evaluation of nanocomposite resist for next generation lithography
2005 · Kenneth E. Gonsalves, Muthiah Thiyagarajan, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7
New resists for nanometer scale patterning by extreme ultraviolet lithography
2005 · Kenneth E. Gonsalves, Muthiah Thiyagarajan, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 7
Works count: 64
Citation count: 543
H-index: 13
I10-index: 20
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