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R. Krishnasamy

SiGe HBT technology with f/sub max//f/sub T/ = 350/300 GHz and gate delay below 3.3 ps
2005 · M. Khater, J.-S. Rieh, et al. · Technical digest - International Electron Devices Meeting/Technical digest · 79
SiGe HBTs for millimeter-wave applications with simultaneously optimized f/sub T/ and f/sub max/ of 300 GHz
2004 · J.-S. Rieh, D. Greenberg, et al. · Digest of papers - IEEE Radio Frequency Integrated Circuits Symposium · 59
RFCMOS technology from 0.25μm to 65nm: the state of the art
2004 · J. Pekarik, D. Greenberg, et al. · Custom Integrated Circuits Conference · 38
Novel Enhanced Stressor with Graded Embedded SiGe Source/Drain for High Performance CMOS Devices
2006 · M. Ieong, J. Sudijono, et al. · Technical digest - International Electron Devices Meeting/Technical digest · 24
Performance Improvements of SiGe HBTs in 90nm BiCMOS Process with fT/fmax of 340/410 GHz
2022 · U. S. Raghunathan, S. Sirohi, et al. · IEEE BiCMOS and Compound Semiconductor Integrated Circuits and Technology Symposium (BCICTS) · 21
Parasitic Drain Series Resistance Effects on Non-conducting Hot Carrier Reliability
2022 · M. J. Hauser, P. Srinivasan, et al. · IEEE International Reliability Physics Symposium proceedings · 8
Effect of hot carrier stress on device junctions measured by electron holography and scanning capacitance microscopy
2018 · Y. Y. Wang, J. Nxumalo, et al. · Applied Physics Letters · 8
0.026µm2 high performance Embedded DRAM in 22nm technology for server and SOC applications
2014 · C. Pei, G. Wang, et al. · Technical digest - International Electron Devices Meeting/Technical digest · 5
2-D shallow junction mapping by dual lens electron holography
2017 · Y. Y. Wang, J. Nxumalo, et al. · International Workshop on Junction Technology · 4
2D carrier profiles by SSRM and TCAD for root cause analysis of low Vt PFET
2017 · J. N. Nxumalo, Y. Y. Wang, et al. · International Workshop on Junction Technology · 1
低V_t PFETの根本原因解析のためのSSRMおよびTCADによる2次元キャリアプロフィル【Powered by NICT】
2017 · J N Nxumalo, Y Y Wang, et al. · IEEE Conference Proceedings
Tantalum lightshield for CMOS image sensor with global shutter
2009 · J. Gambino, R. J. Rassel, et al. · International Conference on Solid State Devices and Materials (SSDM)
Works count: 12
Citation count: 247
H-index: 7
I10-index: 5
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