Author

Keith Jackson

Observed names: Jackson, Keith, Jackson, Keith H., Keith H Jackson, Keith H. Jackson

Observed institutions: Howard University, Lawrence Berkeley National Laboratory, National Society of Black Physicists, Massachusetts Institute of Technology, University of California, Berkeley

OpenAlex ID: A5113517882

Status of EUV micro-exposure capabilities at the ALS using the 0.3-NA MET optic

2004 · Patrick Naulleau, Kenneth A. Goldberg, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 71

Fabrication of miniaturized electrostatic deflectors using LIGA

1995 · Keith H. Jackson, Chantal G. Khan Malek, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 50

Undulator radiation for at-wavelength interferometry of optics for extreme-ultraviolet lithography

1993 · David Attwood, Gary Sommargren, et al. · Applied Optics · 46

System integration and performance of the EUV engineering test stand

2001 · Daniel A. Tichenor, Avijit K. Ray-Chaudhuri, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 41

Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic

2002 · Patrick Naulleau, Kenneth A. Goldberg, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 38

Extreme ultraviolet microexposures at the Advanced Light Source using the 0.3 numerical aperture micro-exposure tool optic

2004 · Patrick P. Naulleau, Kenneth A. Goldberg, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 37

At-wavelength alignment and testing of the 0.3 NA MET optic

2004 · Kenneth A. Goldberg, Patrick P. Naulleau, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 32

EUV microexposures at the ALS using the 0.3-NA MET projection optics

2005 · Patrick Naulleau, Kenneth A. Goldberg, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 27

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Characterization of an EUV Schwarzschild objective using phase-shifting point diffraction interferometry

1997 · Kenneth A. Goldberg, Edita Tejnil, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 24

Masks for high aspect ratio x-ray lithography

1996 · Chantal Khan Malek, Keith H Jackson, et al. · Journal of Micromechanics and Microengineering · 21

EUV interferometric testing and alignment of the 0.3-NA MET optic

2004 · Kenneth A. Goldberg, Patrick Naulleau, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 19

Characterization of the synchrotron-based 0.3 numerical aperture extreme ultraviolet microexposure tool at the Advanced Light Source

2005 · Patrick Naulleau, Jason P. Cain, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 14

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At-wavelength characterization of the extreme ultraviolet Engineering Test Stand Set-2 optic

2001 · Patrick Naulleau, Kenneth A. Goldberg, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 13

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Static microfield printing at the Advanced Light Source with the ETS Set-2 optic

2002 · Patrick P. Naulleau, Kenneth A. Goldberg, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 11

Adding static printing capabilities to the EUV phase-shifting point diffraction interferometer

2001 · Patrick P. Naulleau, Kenneth A. Goldberg, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 11

At-wavelength testing of optics for EUV

1995 · Kenneth A. Goldberg, H. R. Beguiristain, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 9

Ultra-high accuracy optical testing: creating diffraction-limited short-wavelength optical systems

2005 · Kenneth A. Goldberg, Patrick P. Naulleau, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7

Lithographic characterization of the printability of programmed extreme ultraviolet substrate defects

2003 · Patrick Naulleau, Kenneth A. Goldberg, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 7

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EUV interferometry of the 0.3-NA MET optic

2003 · Kenneth A. Goldberg, Patrick P. Naulleau, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 7

Combining and matching optical, electron-beam, and x-ray lithographies in the fabrication of Si complementary metal–oxide–semiconductor circuits with 0.1 and sub-0.1 μm features

1995 · Isabel Y. Yang, Scott Silverman, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 6

Deep etch x-ray lithography at the advanced light source: First results

1994 · Chantal Khan Malek, Keith Jackson, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 6

Static EUV micro-exposures using the ETS Set-2 optics

2003 · Patrick P. Naulleau, Kenneth A. Goldberg, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 5

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High flux undulator beamline optics for EUV interferometry and photoemission microscopy

1996 · H. R. Beguiristain, James H. Underwood, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 4

Preparations for extreme ultraviolet interferometry of the 0.3 numerical aperture Micro Exposure Tool optic

2003 · Kenneth A. Goldberg, Patrick P. Naulleau, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 3

Fabricating subcollimating grids for an x-ray solar imaging spectrometer using LIGA techniques

1995 · Reid A. Brennen, Michael H. Hecht, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 3

Works count: 44

Citation count: 518

H-index: 13

I10-index: 15