Author

Koichi Kuroiwa

Observed names: K Kuroiwa, K. Kuroiwa, Koichi KUROIWA, Koichi Kuroiwa Koichi Kuroiwa

Institution: Tokyo University of Agriculture and Technology

Observed institutions: NTT (Japan), Nissan (Japan), The University of Tokyo, Tokyo University of Agriculture and Technology

OpenAlex ID: A5113590877

Interaction of PbTiO3 Films with Si Substrate

1994 · Yushi Shichi, Satoshi Tanimoto, et al. · Japanese Journal of Applied Physics · 135

Investigation on Leakage Current Reduction of Photo‐CVD Tantalum Oxide Films Accomplished by Active Oxygen Annealing

1992 · S. Tanimoto, M. Matsui, et al. · Journal of The Electrochemical Society · 99

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Photo-Process of Tantalum Oxide Films and Their Characteristics

1988 · Masahiro Matsui, Satoshi Oka, et al. · Japanese Journal of Applied Physics · 72

New 1.5 μm wavelength GaInAsp/InP distributed feedback laser

1982 · Y. Itaya, T. Matsuoka, et al. · Electronics Letters · 49

Longitudinal mode behaviors of 1.5 µm range GaInAsP/InP distributed feedback lasers

1984 · Y. Itaya, T. Matsuoka, et al. · IEEE Journal of Quantum Electronics · 42

Amorphous Silicon Thin-Film Transistors Employing Photoprocessed Tantalum Oxide Films as Gate Insulators

1990 · Masahiro Matsui, Hiroshi Nagayoshi, et al. · Japanese Journal of Applied Physics · 38

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Vapor-Phase Deposition of Beta-Silicon Carbide on Silicon Substrates

1973 · K. Kuroiwa, T. Sugano · Journal of The Electrochemical Society · 30

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Stress tests on 1.3 μm buried-heterostructure laser diode

1983 · T. Ikegami, K. Takahei, et al. · Electronics Letters · 28

Low Pressure Metalorganic Vapor Phase Epitaxy of InP in a Vertical Reactor

1985 · Mamoru Oishi, Koichi Kuroiwa · Journal of The Electrochemical Society · 24

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Low-Temperature Fabrication of Ultrathin ZrO2/Si Structure Using Metal Deposition Followed by Oxygen Annealing

2005 · Yoshitaka Nagasato, Tsutomu Aya, et al. · Japanese Journal of Applied Physics · 20

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Fabrication of c-Axis Oriented Pb(Zr, Ti)O3 Thin Films on Si(100) Substrates Using MgO Intermediate Layer

1996 · Junji Senzaki, Osamu Mitsunaga, et al. · Japanese Journal of Applied Physics · 20

Tantalum Oxide Films Formed by UV Photo-CVD Using Ozone and TaCl5

1991 · Satoshi Tanimoto, Masahiro Matsui, et al. · Japanese Journal of Applied Physics · 19

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HfO2/Si and HfSiO/Si Structures Fabricated by Oxidation of Metal Thin Films

2009 · Yusuke Oniki, Yoshitaka Iwazaki, et al. · Japanese Journal of Applied Physics · 18

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Thermal Properties of Various Ta Precursors Used in Chemical Vapor Deposition of Tantalum Pentoxide

1994 · Hiroyuki Koyama, Satoshi Tanimoto, et al. · Japanese Journal of Applied Physics · 18

Vapor Deposition of Silicon Nitride Film on Silicon and Properties of MNS Diodes

1968 · Takuo Sugano, Katsumi Hirai, et al. · Japanese Journal of Applied Physics · 17

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Metalorganic VPE of InGaAs on InP

1982 · Mamoru Oishi, Koichi Kuroiwa · Japanese Journal of Applied Physics · 13

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High-Intensity Vacuum Ultraviolet Light Source in Windowless Photochemical Vapor Deposition Reactor and Its Application to a-Si:H Deposition

1992 · Koichi Kuroiwa, Hiroshi Yamazaki, et al. · Japanese Journal of Applied Physics · 12

Characterization of µc-Si:H Prepared by Photo-Chemical Vapor Deposition

1986 · Kazuhiko Suzuki, Katsumi Aota, et al. · Japanese Journal of Applied Physics · 11

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Characterization of Photo-CVD a-Si:H Films by Thin-Film Transistor Structure

1986 · Kazuhiko Suzuki, Yohsuke Yukawa, et al. · Japanese Journal of Applied Physics · 10

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Synchronously Excited Discrete Chemical Vapor Deposition of Ta2 O 5

1994 · Satoshi Tanimoto, Nami Shibata, et al. · Journal of The Electrochemical Society · 9

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Doping properties of microcrystalline silicon prepared by mercury sensitized photochemical vapor deposition

1990 · K. Suzuki, K. Kuroiwa, et al. · Applied Physics A · 8

Residual Stress of a-Si1-xNx:H Films Prepared by Afterglow Plasma Chemical Vapor Deposition Technique

1992 · Hiroshi Nagayoshi, Haruji Morinaka, et al. · Japanese Journal of Applied Physics · 7

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Doping-Induced Defects in P-Doped Photo-CVD a-Si:H

1987 · Kazuhiko Suzuki, Toshimi Kominato, et al. · Japanese Journal of Applied Physics · 7

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Highly efficient generation of high-energy photons and low-temperature oxidation of a crystal silicon surface with O1D radicals

1994 · Tomo Ueno, Takeshi Akiyama, et al. · Applied Surface Science · 6

Optical Characterization of Undoped a-Si:H Prepared by Photo-CVD and GD Techniques

1987 · Satoshi Kawasaki, Katsuaki Sato, et al. · Japanese Journal of Applied Physics · 6

Works count: 51

Citation count: 770

H-index: 15

I10-index: 19