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Simi A. George

Critical challenges for EUV resist materials
2011 · Patrick P. Naulleau, Christopher N. Anderson, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 65
Ligand Field Spectra of Some New Laser Chelates
1964 · L. J. Nugent, M. L. Bhaumik, et al. · The Journal of Chemical Physics · 39
Comparative extreme ultraviolet emission measurements for lithium and tin laser plasmas
2007 · Simi A. George, William T. Silfvast, et al. · Optics Letters · 35
Hyperfine-structure measurements in bismuth using a Fourier-transform spectrometer
1985 · S. George, J. Vergès, et al. · Journal of the Optical Society of America B · 35
High conversion efficiency microscopic tin-doped droplet target laser-plasma source for EUVL
2005 · Chiew-Seng Koay, Simi George, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 34
22-nm Half-pitch extreme ultraviolet node development at the SEMATECH Berkeley microfield exposure tool
2009 · Patrick P. Naulleau, Christopher N. Anderson, et al. · Microelectronic Engineering · 26
13.5 nm EUV generation from tin-doped droplets using a fiber laser
2007 · Simi A. George, Kai-Chung Hou, et al. · Optics Express · 26
Replicated mask surface roughness effects on EUV lithographic patterning and line edge roughness
2011 · Simi A. George, Patrick P. Naulleau, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 23
Implications of image plane line-edge roughness requirements on extreme ultraviolet mask specifications
2009 · Patrick P. Naulleau, Simi A. George · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 23
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Characterization of line-edge roughness (LER) propagation from resists: underlayer interfaces in ultrathin resist films
2010 · Simi A. George, Patrick P. Naulleau, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 19
High power fiber laser driver for efficient EUV lithography source with tin-doped water droplet targets
2008 · Kai-Chung Hou, Simi George, et al. · Optics Express · 15
Diagnostics for laser plasma EUV sources
2005 · Martin C. Richardson, Chiew-Seng Koay, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 15
Newly observed lines and hyperfine structure in the infrared spectrum of indium obtained by using a Fourier-transform spectrometer
1990 · S. George, J. Verges, et al. · Journal of the Optical Society of America B · 15
Extreme ultraviolet mask substrate surface roughness effects on lithographic patterning
2010 · Simi A. George, Patrick P. Naulleau, et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 14
Assessing out-of-band flare effects at the wafer level for EUV lithography
2010 · Simi A. George, Patrick P. Naulleau, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 14
Estimating the out-of-band radiation flare levels for extreme ultraviolet lithography
2009 · Simi A. George, Patrick P. Naulleau, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 14
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Latest results from the SEMATECH Berkeley extreme ultraviolet microfield exposure tool
2009 · Patrick P. Naulleau, Christopher N. Anderson, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 14
EUV spectroscopy of mass-limited Sn-doped laser micro-plasmas
2005 · Simi George, Chiew-Seng Koay, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 14
Laser plasma EUVL sources: progress and challenges
2004 · Martin C. Richardson, Chiew-Seng Koay, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 14
An elementary introduction to practical holography
1975 · Alan G. Porter, S. George · American Journal of Physics · 12
Interferometric Measurements of the Hyperfine Structure in Bismuth
1970 · S. George, R. A. Klingberg · Journal of the Optical Society of America · 11
Planck's Constant from Wien's Displacement Law
1972 · S. George, J. E. Fredrickson, et al. · American Journal of Physics · 10
The SEMATECH Berkeley microfield exposure tool: learning at the 22-nm node and beyond
2009 · Patrick P. Naulleau, Christopher N. Anderson, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8
Absolute sensitivity calibration of extreme ultraviolet photoresists
2008 · Patrick P. Naulleau, Eric M. Gullikson, et al. · Optics Express · 8
EUV generation from lithium laser plasma for lithography
2006 · Simi A. George, William Silfvast, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 8
Works count: 82
Citation count: 621
H-index: 14
I10-index: 22
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