Author

Ekaterina M. Kaznacheeva

Institution: Ivanovo State University of Chemistry and Technology

Observed institution: Ivanovo State University of Chemistry and Technology

OpenAlex ID: A5115541966

On Effects of Initial Cf4 + Chf3 + O2 Mixture Composition on Plasma Parameters and Reactive-ion Etching of Silicon

2024 · Alexander M. Efremov, Alexander V. Bobylev, et al. · IZVESTIYA VYSSHIKH UCHEBNYKH ZAVEDENIY KHIMIYA KHIMICHESKAYA TEKHNOLOGIYA

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