Platform for the study of ion implantation, Controlled and Analyzed at the nanoscale
Description: The aim of the PELIICAEN project is to develop an innovative experimental set-up allowing creation, modification and analysis of nano-structures and their controlled 3-D doping. Localised ion implantation is essential for research and development in nano-science and nano-technology. It is widely used in micro-electronics, nano-photonics, spin-tronics and the engineering of the nano-materials because it allows a precise modification of their electrical, optical, magnetic and chemical properties of materials at the nano-metric scale. In comparison to mask techniques for localised implantation, the FIB technology appears to be the most promising technique owing to its great versatility. The advent of LMIS Gallium sources was the starting point of the success of the FIB technology, which has enormously contributed to the spectacular progress in the fields of nano-science and nano-technology. This technology is widely used for the creation and analysis of nano-components or nano-structured materials. The application of FIB is equally found in research laboratories as well as in the semiconductor industry. The recent developments in FIB technology were mainly undertaken in order to improve their resolution as well as their current intensity. Nowadays, the state-of-the-art imaging resolution for Ga FIB units, achieved by the Cobra-FIB of Orsay Physics, is better than 2.5 nm. Moreover, the resolution for GFIS sources, due to their atomic scale, can now reach the sub-nanometer scale for He ions. In order to obtain high currents, plasma sources have also been developed. In this field, the state of the art is a mini ECR source coupled with an i-FIB of Orsay Physics which delivers a current of several micro-amperes on the target. Another area of present FIB development resides in improving the diversity of the accelerated ion species. On the one hand, non-polluting ion beams are developed, e.g. rare gas ions. On the other hand, ion beams from reactive species are studied either for analysis purposes (Cs, O) or to dope and therefore modify locally the electronic properties of the target. Many studies are underway on a large array of different sources (e.g. LMAIS), in order to dope locally the target. However, the choice of the ion species as well as the choice of the implantation depth is still very limited. We propose in this project a new approach, combining known technologies, based on FIB and ECRIS techniques, to produce focused ion beams with a much larger choice of ion species and implantation technique than presently attainable. Such a tool will have an enormous impact in the fields of nano-science and nano-technology, because it will offer new possibilities to modify matter at the sub-micron level in the three dimensions. Depending on the used ion species, fluences, energies and type of materials, it will allow: - to produce three-dimensional grids of regions doped with different species and concentrations; - to target and modify specific zones in 3-D; - to modify the atomic structure of irradiates zones by means of defect creation or phase transformation; - to change locally the chemical composition in order to synthesize new material phases, which are sometimes unattainable by conventional methods. These techniques can be used in many applications involving the need to implant “any ion at any place”. The unique partnership between CEA/CIMAP, expert in ion-matter interactions, and Orsay Physics, a French SMB and one of the world leaders for the development and commercialization of FIB/FEB units and secondary emission imagery, presents a big potential to successfully finalize this innovative project, which is eagerly awaited by a large scientific community.
Funder: Agence Nationale de la Recherche
Amount: €703,700
Funding type: grant
Funder scheme: P2N
Start date: 2013-01-01
Investigator: Stéphane GUILLOUS
Institution: Centre de Recherche sur les Ions, les Matériaux et la Photonique
Funded outputs count: 5
Funder award ID: ANR-12-NANO-0008
OpenAlex ID: G4450092558