A rational reduced model for elastic layers and its application in pattern formation analysis
Description: Stress-induced wrinkling patterns at micro- and sub-micro-scales have a growing variety of applications ranging from cell patterning, optical gratings, creation of surfaces with desired wetting and adhesion properties, to buckling-based metrology. Although much progress has been made in recent decades, a deeper understanding of the pattern formation mechanisms has been hampered by the complexity of the governing equations. This proposal aims to
break a bottleneck in the mathematical modelling of pattern formation in film-substrate bilayers. We will derive a rational reduced model for the film behaviour under the frameworks of nonlinear elasticity and Stroh formalism that incorporates nonlinearity, anisotropy, and pre-stretch in a self-consistent manner. The power of the new model will be illustrated by analysing period-doubling secondary bifurcation and ridge formation that have been much studied but not yet fully understood.
Amount: £52,380
Funding type: research
Start date: 2022-07-31
End date: 2024-04-29
Subfield: Mechanical Engineering
Field: Engineering
Domain: Physical Sciences
Funded outputs count: 8
Funder award ID: EP/W007150/1
OpenAlex ID: G4792303232