Keyword

etch rate

Description: Etch rate is the amount of material removed per unit time during an etching process, commonly measured as a thickness change over time.

Primary topic: Plasma Diagnostics and Applications (34%)

OpenAlex ID: keywords/etch-rate

Anisotropic Etching of Crystalline Silicon in Alkaline Solutions: I . Orientation Dependence and Behavior of Passivation Layers

1990 · H. Seidel, L. Csepregi, et al. · Journal of The Electrochemical Society · 1,635

Metal-assisted chemical etching in HF/H2O2 produces porous silicon

2000 · X. Li, P. W. Bohn · Applied Physics Letters · 1,042

Etch rates for micromachining processing-part II

2003 · K.R. Williams, K. Gupta, et al. · Journal of Microelectromechanical Systems · 1,028

High aspect ratio silicon etch: A review

2010 · Banqiu Wu, Ajay Kumar, et al. · Journal of Applied Physics · 751

Self-developing photoetching of poly(ethylene terephthalate) films by far-ultraviolet excimer laser radiation

1982 · R. Srinivasan, V. Mayne-Banton · Applied Physics Letters · 714

Metal-assisted chemical etching of silicon in HF–H2O2

2008 · C. Chartier, S. Bastide, et al. · Electrochimica Acta · 657

Etch rates for micromachining processing

1996 · K.R. Williams, R.S. Muller · Journal of Microelectromechanical Systems · 648

Plasma etching of Si and SiO2—The effect of oxygen additions to CF4 plasmas

1978 · C. J. Mogab, A. C. Adams, et al. · Journal of Applied Physics · 572

The mechanism of HF formation in LiPF6 based organic carbonate electrolytes

2011 · S.F. Lux, I.T. Lucas, et al. · Electrochemistry Communications · 535

Anisotropic etching of silicon in TMAH solutions

1992 · Osamu Tabata, Ryouji Asahi, et al. · Sensors and Actuators A Physical · 466

Wet chemical etching of silicate glasses in hydrofluoric acid based solutions

1993 · G. A. C. M. Spierings · Journal of Materials Science · 413

Characterization of a Time Multiplexed Inductively Coupled Plasma Etcher

1999 · A. A. Ayón, R. Braff, et al. · Journal of The Electrochemical Society · 412

Excimer laser etching of polyimide

1985 · J. H. Brannon, J. R. Lankard, et al. · Journal of Applied Physics · 389

A New Preferential Etch for Defects in Silicon Crystals

1977 · Margaret Wright Jenkins · Journal of The Electrochemical Society · 372

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The energy balance at substrate surfaces during plasma processing

2001 · H. Kersten, H. Deutsch, et al. · Vacuum · 368

Modified Thornton model for magnetron sputtered zinc oxide: film structure and etching behaviour

2003 · Oliver Kluth, Gunnar Schöpe, et al. · Thin Solid Films · 353

Post‐Synthetic Anisotropic Wet‐Chemical Etching of Colloidal Sodalite ZIF Crystals

2015 · Civan Avci, Javier Ariñez‐Soriano, et al. · Angewandte Chemie International Edition · 339

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Low-temperature reactive ion etching and microwave plasma etching of silicon

1988 · Shinichi Tachi, Kazunori Tsujimoto, et al. · Applied Physics Letters · 338

The reaction of fluorine atoms with silicon

1981 · Daniel L. Flamm, Vincent M. Donnelly, et al. · Journal of Applied Physics · 334

Characterization of orientation-dependent etching properties of single-crystal silicon: effects of KOH concentration

1998 · Kazuo Sato, Mitsuhiro Shikida, et al. · Sensors and Actuators A Physical · 330

Etching Mechanism of Vitreous Silicon Dioxide in HF-Based Solutions

2000 · D. Martin Knotter · Journal of the American Chemical Society · 322

Etching materials with an atmospheric-pressure plasma jet

1998 · J Y Jeong, S E Babayan, et al. · Plasma Sources Science and Technology · 316

A Water-Amine-Complexing Agent System for Etching Silicon

1967 · R. M. Finne, D. L Klein · Journal of The Electrochemical Society · 311

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Fabrication of nanopillars by nanosphere lithography

2006 · C L Cheung, R J Nikolić, et al. · Nanotechnology · 309

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The etching of silicon with XeF2 vapor

1979 · H. F. Winters, J. W. Coburn · Applied Physics Letters · 309

Works count: 10,420

Citation count: 147,600