Keyword

line width roughness

Description: The variation in the measured width of a patterned line, a nanoscale fabrication and metrology measure often abbreviated LWR.

Primary topic: Advancements in Photolithography Techniques (84%)

OpenAlex ID: keywords/line-width-roughness

Resist Materials and Processes for Extreme Ultraviolet Lithography

2012 · Toshiro Itani, Takahiro Kozawa · Japanese Journal of Applied Physics · 186

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Extreme ultraviolet lithography and three dimensional integrated circuit—A review

2014 · Banqiu Wu, Ajay Kumar · Applied Physics Reviews · 158

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Evaluation of EUV resist materials for use at the 32 nm half-pitch node

2008 · Thomas Wallow, Craig Higgins, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 108

Stochastic effects in EUV lithography: random, local CD variability, and printing failures

2017 · Peter De Bisschop · Journal of Micro/Nanopatterning Materials and Metrology · 107

Line edge roughness and critical dimension variation: Fractal characterization and comparison using model functions

2004 · V. Constantoudis, G. P. Patsis, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 101

High resolution, high sensitivity inorganic resists

2008 · Jason Stowers, Douglas A. Keszler · Microelectronic Engineering · 99

Experimental Investigation of the Impact of LWR on Sub-100-nm Device Performance

2004 · H.-W. Kim, J.-Y. Lee, et al. · IEEE Transactions on Electron Devices · 91

Investigations on Line-Edge Roughness (LER) and Line-Width Roughness (LWR) in Nanoscale CMOS Technology: Part II–Experimental Results and Impacts on Device Variability

2013 · Runsheng Wang, Xiaobo Jiang, et al. · IEEE Transactions on Electron Devices · 87

Materials challenges for sub-20-nm lithography

2011 · James W. Thackeray · Journal of Micro/Nanopatterning Materials and Metrology · 86

Technology review and assessment of nanoimprint lithography for semiconductor and patterned media manufacturing

2011 · Matt Malloy, Lloyd C. Litt · Journal of Micro/Nanopatterning Materials and Metrology · 80

Novel method for characterizing resist performance

2008 · David Van Steenwinckel, Roel Gronheid, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 78

Automated Defect and Correlation Length Analysis of Block Copolymer Thin Film Nanopatterns

2015 · Jeffrey N. Murphy, Kenneth D. Harris, et al. · PLoS ONE · 76

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Unbiased estimation of linewidth roughness

2005 · J. S. Villarrubia, B. D. Bunday · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 70

Improvements in resist performance towards EUV HVM

2017 · Oktay Yildirim, Elizabeth Buitrago, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 69

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The effects of chemical gradients and photoresist composition on lithographically generated line edge roughness

2005 · Timothy B. Michaelson, Adam R. Pawloski, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 68

Characterization of correlated line edge roughness of nanoscale line gratings using small angle x-ray scattering

2007 · Chengqing Wang, Ronald L. Jones, et al. · Journal of Applied Physics · 60

EUV lithography

2006 · Kevin Kemp, Stefan Wurm · Comptes Rendus Physique · 60

Need for LWR metrology standardization: the imec roughness protocol

2018 · Gian Francesco Lorusso, Takumichi Sutani, et al. · Journal of Micro/Nanopatterning Materials and Metrology · 58

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Large-Area Superconducting Nanowire Single-Photon Detectors for Operation at Wavelengths up to 7.4 μm

2022 · Marco Colangelo, Alexander B. Walter, et al. · Nano Letters · 57

Direct metal etch of ruthenium for advanced interconnect

2018 · Sara Paolillo, Danny Wan, et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 57

Statistical simulation of photoresists at EUV and ArF

2009 · John J. Biafore, Mark D. Smith, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 57

Innovative UV nanoimprint lithography using a condensable alternative chlorofluorocarbon atmosphere

2014 · Shinji Matsui, Hiroshi Hiroshima, et al. · Microelectronic Engineering · 54

Unbiased line width roughness measurements with critical dimension scanning electron microscopy and critical dimension atomic force microscopy

2012 · L. Azarnouche, E. Pargon, et al. · Journal of Applied Physics · 54

Technological merits, process complexity, and cost analysis of self-aligned multiple patterning

2012 · Yijian Chen, Qi Cheng, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 53

Overview: continuous evolution on double-patterning process

2012 · Hidetami Yaegashi, Kenichi Oyama, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 52

Works count: 1,181

Citation count: 10,540