Keyword

resist sensitivity

Description: The exposure response of a lithographic resist, commonly expressed as the dose required to produce a specified pattern or development outcome.

Primary topic: Advancements in Photolithography Techniques (95%)

OpenAlex ID: keywords/resist-sensitivity

Chemical amplification in the design of dry developing resist materials

1983 · Hiroshi Ito, C. Grant Willson · Polymer Engineering and Science · 464

Three-dimensional siloxane resist for the formation of nanopatterns with minimum linewidth fluctuations

1998 · Hideo Namatsu, Yasuo Takahashi, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 298

Using high-contrast salty development of hydrogen silsesquioxane for sub-10-nm half-pitch lithography

2007 · Joel K. W. Yang, Karl K. Berggren · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 203

Review of recent advances in inorganic photoresists

2020 · Chaoyun Luo, Chanchan Xu, et al. · RSC Advances · 198

PDF

Photolithographic properties of tin-oxo clusters using extreme ultraviolet light (13.5nm)

2014 · Brian Cardineau, Ryan Del Re, et al. · Microelectronic Engineering · 193

Resist Materials and Processes for Extreme Ultraviolet Lithography

2012 · Toshiro Itani, Takahiro Kozawa · Japanese Journal of Applied Physics · 186

PDF

High-resolution Positive Resists for Electron-beam Exposure

1968 · I. Haller, M. Hatzakis, et al. · IBM Journal of Research and Development · 180

Deep uv lithography

1975 · Burn Jeng Lin · Journal of Vacuum Science and Technology · 161

Study of a high contrast process for hydrogen silsesquioxane as a negative tone electron beam resist

2003 · W. Henschel, Y. M. Georgiev, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 154

Developer Characteristics of Poly‐(Methyl Methacrylate) Electron Resist

1975 · James S. Greeneich · Journal of The Electrochemical Society · 150

Sub-10-nm nanolithography with a scanning helium beam

2009 · Vadim Sidorkin, Emile van Veldhoven, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 135

PDF

Use of SU-8 photoresist for very high aspect ratio x-ray lithography

2000 · A.L. Bogdanov, S.S. Peredkov · Microelectronic Engineering · 132

Chemical amplification resists: Inception, implementation in device manufacture, and new developments

2003 · Hiroshi Ito · Journal of Polymer Science Part A Polymer Chemistry · 121

Quantum Wire Fabrication by E-Beam Elithography Using High-Resolution and High-Sensitivity E-Beam Resist ZEP-520

1992 · Toshio Nishida, Masaya Notomi, et al. · Japanese Journal of Applied Physics · 120

PDF

Comparison of MIBK/IPA and water/IPA as PMMA developers for electron beam nanolithography

2002 · Shazia Yasin, D.G. Hasko, et al. · Microelectronic Engineering · 114

Applications of Photoinitiators to the Design of Resists for Semiconductor Manufacturing

1984 · HIROSHI ITO, C. GRANT WILLSON · ACS symposium series · 107

High resolution, high sensitivity inorganic resists

2008 · Jason Stowers, Douglas A. Keszler · Microelectronic Engineering · 99

Optimal temperature for development of poly(methylmethacrylate)

2007 · Bryan Cord, Jodie Lutkenhaus, et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 92

A New Negative-Type Photosensitive Polyimide Based on Poly(hydroxyimide), a Cross-Linker, and a Photoacid Generator

1996 · Mitsuru Ueda, Tomonari Nakayama · Macromolecules · 91

Polymerized monomolecular layers: A new class of ultrathin resins for microlithography

1980 · André Barraud, Charles Rosilio, et al. · Thin Solid Films · 89

Dendrimers with Thermally Labile End Groups: An Alternative Approach to Chemically Amplified Resist Materials Designed for Sub-100 nm Lithography

2000 · D. C. Tully, A. R. Trimble, et al. · Advanced Materials · 87

Evaluation of EUV resist performance with interference lithography towards 11 nm half-pitch and beyond

2013 · Yasin Ekinci, Michaela Vockenhuber, et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 83

PDF

Grey scale structures formation in SU-8 with e-beam and UV

2003 · V. Kudryashov, X.-C. Yuan, et al. · Microelectronic Engineering · 83

A new inorganic electron resist of high contrast