Keyword

step coverage

Description: The extent to which a deposited thin film coats step-like surface features, an important measure in semiconductor fabrication and thin-film processing.

Primary topic: Copper Interconnects and Reliability (37%)

OpenAlex ID: keywords/step-coverage

Damascene copper electroplating for chip interconnections

1998 · P. C. Andricacos, C. Uzoh, et al. · IBM Journal of Research and Development · 1,223

Atomic Layer Deposition of Hafnium and Zirconium Oxides Using Metal Amide Precursors

2002 · Dennis M. Hausmann, Esther Kim, et al. · Chemistry of Materials · 542

A Kinetic Model for Step Coverage by Atomic Layer Deposition in Narrow Holes or Trenches

2003 · R.G. Gordon, D. Hausmann, et al. · Chemical Vapor Deposition · 392

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Deposition of Conformal Copper and Nickel Films from Supercritical Carbon Dioxide

2001 · Jason M. Blackburn, David P. Long, et al. · Science · 386

Temperature dependence of the sticking and loss probabilities of silyl radicals on hydrogenated amorphous silicon

1990 · Akihisa Matsuda, Katsuhiko Nomoto, et al. · Surface Science · 263

Film formation mechanisms in the plasma deposition of hydrogenated amorphous silicon

1986 · C. C. Tsai, J. C. Knights, et al. · Journal of Applied Physics · 225

An atomistic simulator for thin film deposition in three dimensions

1998 · Hanchen Huang, George H. Gilmer, et al. · Journal of Applied Physics · 218

Reactive Plasma Deposited Si‐N Films for MOS‐LSI Passivation

1978 · A. K. Sinha, H. J. Levinstein, et al. · Journal of The Electrochemical Society · 204

Highly Conformal Thin Films of Tungsten Nitride Prepared by Atomic Layer Deposition from a Novel Precursor

2003 · Jill S. Becker, Seigi Suh, et al. · Chemistry of Materials · 149

Diffusion barrier properties of tungsten nitride films grown by atomic layer deposition from bis(tert-butylimido)bis(dimethylamido)tungsten and ammonia

2003 · Jill S. Becker, Roy G. Gordon · Applied Physics Letters · 148

Characterization of Plasma‐Deposited Silicon Dioxide

1981 · A. C. Adams, F. B. Alexander, et al. · Journal of The Electrochemical Society · 144

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Atomic Layer Deposition of SrTiO3 Thin Films with Highly Enhanced Growth Rate for Ultrahigh Density Capacitors

2011 · Sang Woon Lee, Jeong Hwan Han, et al. · Chemistry of Materials · 139

Atomic Layer Deposition of Lithium Tantalate Solid-State Electrolytes

2013 · Jian Liu, Mohammad N. Banis, et al. · The Journal of Physical Chemistry C · 138

Wafer-scale, conformal and direct growth of MoS2 thin films by atomic layer deposition

2016 · Yujin Jang, Seungmin Yeo, et al. · Applied Surface Science · 134

Structural, electrical, and optical properties of transparent gallium oxide thin films grown by plasma-enhanced atomic layer deposition

2005 · F. K. Shan, G. X. Liu, et al. · Journal of Applied Physics · 131

A unified line-of-sight model of deposition in rectangular trenches

1990 · T. S. Cale, G. B. Raupp · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 125

Silicon Dioxide Deposition by Atmospheric Pressure and Low‐Temperature CVD Using TEOS and Ozone

1990 · K. Fujino, Y. Nishimoto, et al. · Journal of The Electrochemical Society · 124

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New reaction kinetics for a high‐rate chemical bath deposition of the Zn(S,O) buffer layer for Cu(In,Ga)Se2‐based solar cells

2012 · Dimitrios Hariskos, Richard Menner, et al. · Progress in Photovoltaics Research and Applications · 119

Plasma-Enhanced Atomic Layer Deposition of Ta-N Thin Films

2002 · Jin-Seong Park, Hyung-Sang Park, et al. · Journal of The Electrochemical Society · 119

High resolution, steep profile resist patterns

1979 · J. M. Moran, D. Maydan · Journal of Vacuum Science and Technology · 118

Atomic Layer Deposition of Insulating Hafnium and Zirconium Nitrides

2004 · Jill S. Becker, Esther Kim, et al. · Chemistry of Materials · 116

Thin Polymer Films with High Step Coverage in Microtrenches by Initiated CVD

2008 · Salmaan H. Baxamusa, Karen K. Gleason · Chemical Vapor Deposition · 115

Plasma enhanced atomic layer deposition of SiNx:H and SiO2

2011 · Sean W. King · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 113

Silicon oxide deposition from tetraethoxysilane in a radio frequency downstream reactor: Mechanisms and step coverage

1989 · Nur Selamoglu, John A. Mucha, et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 113

The Deposition of Silicon Dioxide Films at Reduced Pressure

1979 · A. C. Adams, C. D. Capio · Journal of The Electrochemical Society · 112

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Works count: 1,734

Citation count: 25,360