Work

Ultrahigh selective etching of Si3N4 films over SiO2 films for silicon nitride gate spacer etching

Year: 2010

Type: article

Source: Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena

DOI: 10.1116/1.3290752

Authors: Sunghoon Lee, Jinho Oh, Kyumin Lee, Hyunchul Sohn

Institution: Yonsei University

Language: English

Topic: Low-Pressure Plasma Processing and Diagnostics

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W13173232

FWCI: 1.225

Cites: 16

Cited by: 39

Related to: 10