Absorption Measurement of Zn Atom Density during ICP-assisted Magnetron Sputter-deposition of Al-doped ZnO Thin Films
Year: 2009
Type: conference-paper
Abstract: This paper reports the outlines of hollow cathode (HCD) lamp absorption system for the density measurement of sputtered metal atoms in the inductively coupled plasma (ICP) assisted sputter-deposition process of Al doped ZnO thin films. As a result, absorbance of about 6.5% was obtained, which corresponds to the Zn atom density of 1.5×1012 cm-3.
Authors: Iwata, Tadashi, Kan, Ryouji, Shibasaki, Takashi, Shinohara, Masanori, Matsuda, Yoshinobu
Institution: Nagasaki University
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: green
OpenAlex ID: W144091350