Work

Anomalous outdiffusion of beryllium implanted into silicon

Year: 1974

Type: article

Source: OSTI OAI (U.S. Department of Energy Office of Scientific and Technical Information)

Authors: A. Hurrle, M. Schulz

Language: English

Topic: Semiconductor materials and interfaces

Subfield: Atomic and Molecular Physics, and Optics

Field: Physics and Astronomy

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W161815952

FWCI: 0.308

Cites:

Cited by: 2

Related to: 10