Work

Properties of various silicon oxide phases in thin films

Year: 1980
Type: article
Abstract: Layers of SiO2 with reproducible properties can be manufactured relatively easily today. In the case of SiO and Si2O3 layers, it is necessary to carefully check all of the manufacturing parameters for producing layers with reproducible properties. The properties of the layers in the case of SiO2 do conform to expectations. In the case of Si2O3 and SiO, they can be understood at least qualitatively. Additional interesting models are available for a quantitative understanding.
Author: Elmar Ritter
Language: English
Open Access status: green
OpenAlex ID: W1650477385
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