Work

Electroless deposition of Ni–B, Co–B and Ni–Co–B alloys using dimethylamineborane as a reducing agent

Year: 1998

Type: article

Source: Journal of Applied Electrochemistry

DOI: 10.1023/a:1003233715362

Authors: T. Saito, E. Sato, M. Matsuoka, C. Iwakura

Institutions: Ritsumeikan University, Osaka Prefecture University

Language: English

Topic: Electrodeposition and Electroless Coatings

Subfield: Surfaces, Coatings and Films

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W1669752

FWCI: 1.13

Cites: 4

Cited by: 95

Related to: 10