A high-performance sub-0.25 μm CMOS technology with multiple thresholds and copper interconnects
Year: 2002
Type: conference-paper
Source: Symposium on VLSI Technology
Authors: L. Su, R. Schulz, J. Adkisson, K. Beyer, G. Biery, W. Cote, E. Crabbe, D. Edelstein, J. Ellis-Monaghan, E. Eld, D. Foster, R. Gehres, R. Goldblatt, N. Greco, C. Guenther, J. Heidenreich, J. Herman, D. Kiesling, L. Lin, S.-H. Lo, J. McKenna, C. Megivern, H. Ng, J. Oberschmidt, A. Ray, N. Rohrer, K. Tallman, T. Wagner, B. Davari
Institution: IBM (United States)
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W1892460909