Spin-on dielectric stack low-k integration with EB curing technology for 45nm-node and beyond
Year: 2004
Type: conference-paper
Authors: H. Nagai, K. Maekawa, M. Iwashita, M. Muramatsu, K. Kubota, K. Hinata, T. Kokubo, A. Shiota, M. Hattori, H. Nagano, K. Tokushige, M. Kodera, K. Mishima
Institutions: Tokyo Electron (Japan), JSR (Japan), Ebara (Japan)
Language: English
Field: Materials Science
Domain: Physical Sciences
Open Access status: closed
Funder: Cure EB
OpenAlex ID: W1899112478